[paper] On the Physical Behavior of Cryogenic IV and III-V Schottky Barrier MOSFET Devices

On the Physical Behavior of Cryogenic IV and III–V Schottky Barrier MOSFET Devices

Mike Schwarz, Member, IEEE, Laurie E. Calvet, Member, IEEE, John P. Snyder, Member, IEEE, Tillmann Krauss, Udo Schwalke, Senior Member, IEEE, and Alexander Kloes, Senior Member, IEEE

in IEEE TED , vol.PP, no.99, pp.1-8

doi: 10.1109/TED.2017.2726899

Abstract: The physical influence of temperature down to the cryogenic regime is analyzed in a comprehensive study and the comparison of IV and III-V Schottky barrier (SB) double-gate MOSFETs. The exploration is done using the Synopsys TCAD Sentaurus device simulator and first benchmarked with experimental data. The important device physics of both SB-MOSFETs and conventional MOSFETs are reviewed. The impact of temperature on device performance down to the liquid-nitrogen regime is then explored. We find reduced drive currents in SB-MOSFETs fabricated on small effective mass materials and that SB lowering can significantly improve SB-MOSFETs, especially at low temperatures [read more...]

This article has been accepted for inclusion in a future issue of this journal. Content is final as presented, with the exception of pagination

[paper] Circuit-level simulation methodology for Random Telegraph Noise by using Verilog-AMS

T. Komawaki, M. Yabuuchi, R. Kishida, J. Furuta, T. Matsumoto and K. Kobayashi

Circuit-level simulation methodology for Random Telegraph Noise by using Verilog-AMS

2017 IEEE ICICDT, Austin, TX, USA, 2017, pp. 1-4.

doi: 10.1109/ICICDT.2017.7993526

Abstract: As device sizes are downscaled to nanometer, Random Telegraph Noise (RTN) becomes dominant. It is indespensable to accurately estimate the effect of RTN. We propose the RTN simulation method for analog circuits. It is based on the charge trapping model. We replicate the RTN-induced threshold voltage fluctuation to attach a variable DC voltage source to the gate of MOSFET by using Verilog-AMS. We confirm that drain current of MOSFETs temporally fluctuates. The fluctuations of RTN are different for each MOSFET. Our proposed method can be applied to estimate the temporal impact of RTN including multiple transistors. We can successfully replicate RTN-induced frequency fluctuations in 3-stage ring oscillators as similar as the measurement results [read more...]

Circuit Design and Simulation Project using eSim

Invitation to participate in Circuit Design and Simulation Project using eSim

The FOSSEE (Free and Open Source Software for Education) project based at lIT Bombay has initiated a Circuit Design and Simulation Project using esim (an open source EDA tool for circuit design, simulation, analysis and PCB design).

Interested candidates can take any solved electronic circuit from any source and redesign it using eSim and submit it to us. Candidates will be rewarded with certificates and honorarium after a review process. These circuits will also be published on our website under an appropriate open source license. 

For more details, please visit: http://esim.fossee.in/circuit-simulation-project

Analysis of Short-Channel Effects in Junctionless DG MOSFETs #papers https://t.co/P2sqAueamw

Analysis of Short-Channel Effects in Junctionless DG MOSFETs #papers https://t.co/P2sqAueamw

— Wladek Grabinski (@wladek60) July 26, 2017

from Twitter https://twitter.com/wladek60

July 26, 2017 at 11:39AM
via IFTTT

[paper] A Compact Model for the Statistics of the Low-Frequency Noise of MOSFETs With Laterally Uniform Doping

M. Banaszeski da Silva, H. P. Tuinhout, A. Zegers-van Duijnhoven, G. I. Wirth and A. J. Scholten

"A Compact Model for the Statistics of the Low-Frequency Noise of MOSFETs With Laterally Uniform Doping" 

in IEEE TED, vol. 64, no. 8, pp. 3331-3336, Aug. 2017.
doi: 10.1109/TED.2017.2713301

Abstract: In this paper, we develop a compact physics-based statistical model for random telegraph noise-related low-frequency noise in bulk MOSFETS with laterally uniform doping. The proposed model is suited for modern compact device models, such as PSP, BSIM, and EKV. With our proposed model, one can calculate the expected value and the variability of the noise as a function of bias and device parameters. We validate the model through numerous experimental results from different CMOS nodes, down to 40 nm [read more...]

[paper] Compact On-Wafer Test Structures for Device RF Characterization

B. Kazemi Esfeh, K. Ben Ali and J. P. Raskin IEEE Fellow

Compact On-Wafer Test Structures for Device RF Characterization

in IEEE TED, vol. 64, no. 8, pp. 3101-3107, Aug. 2017
doi: 10.1109/TED.2017.2717196

Abstract: The main objective of this paper is to validate the radio frequency (RF) characterization procedure based on compact test structures compatible with 50um pitch RF probes. It is shown that by using these new test structures, the layout geometry and hence the on-chip space consumption for complete sets of passive and active devices, e.g., coplanar waveguide transmission lines and RF MOSFETs, is divided by a factor of two. The validity domain of these new compact test structures is demonstrated by comparing their measurement results with classical test structures compatible with 100–150um pitch RF probes. 50um -pitch de-embedding structures have been implemented on 0.18um RF silicon-on-insulator (SOI) technology. Cutoff frequencies and parasitic elements of the RF SOI transistors are extracted and the RF performance of trap-rich SOI substrates is analyzed under small- and large-signal conditions [read more...]

[mos-ak] [2nd Announcement and Call for Papers] 15th MOS-AK ESSDERC/ESSCIRC Workshop

MOS-AK ESSDERC/ESSCIRC Workshop
http://www.mos-ak.org/leuven_2017/
September 11, 2017 Leuven
2nd Announcement and Call for Papers

Together with the ASCENT Network represented by Profs Jim Greer and Nicolas Cordero as well as  International MOS-AK Board of R&D Advisers: Larry Nagel, Omega Enterprises Consulting (USA), Andrei Vladimirescu, UCB (USA); ISEP (FR) and all the Extended MOS-AK TPC Committee, we have pleasure to invite to the 15th MOS-AK Compact Modeling Workshop which will be organized for consecutive 15time as in integral part of the ESSDERC/ESSCIRC Conference in Leuven on Sept.11, 2017.

Planned MOS-AK workshop is organized with aims to strengthen a network and discussion forum among experts in the field, enhance open platform for information exchange related to compact/SPICE modeling and Verilog-A standardization, bring people in the compact modeling field together, as well as obtain feedback from technology developers, circuit designers, and CAD/EDA tool developers and vendors.

Important Dates:

• Preannouncement - March 2017
• Call for Papers - June 2017
• Final Workshop Program - August 2017
• MOS-AK Workshop - Sept.11, 2017

Venue: Leuven (B) <http://www.esscirc-essderc2017.org/venue>

Topics to be covered include the following among other related to the compact/SPICE modeling :

• Compact Modeling (CM) of the electron devices
• Advances in semiconductor technologies and processing
• Verilog-A language for CM standardization
• New CM techniques and extraction software
• Open Source TCAD/EDA modeling and simulation
• CM of passive, active, sensors and actuators
• Emerging Devices, TFT, CMOS and SOI-based memory cells
• Microwave, RF device modeling, high voltage device modeling
• Nanoscale CMOS devices and circuits
• Technology R&D, DFY, DFT and reliability/ageing IC Designs
• Foundry/Fabless Interface Strategies

Speakers: (tentative list in alphabetic order)

• Nicolas Cordero, Tyndal (IRL)
• Denis Flandre, CUL (B)
• Jim Greer, Tyndal (IRL)
• Benjamin Iniguez URV (SP)
• Marcelo Pavanello, FEI (BR)
• Jean-Pierre Raskin, CUL (B)
• Wim Schoenmaker, Magwel (B)
• Chika Tanaka, Toshiba (J)
• Ashkhen Yesayan, IRPhE (AM)

Prospective authors should submit abstract online

Manuscript submission deadline: 31sth July 2017 (Monday)
(any related inquiries can be sent to papers@mos-ak.org)

Online Workshop Registration

using online registration form <http://www.esscirc-essderc2017.org/howtoregister>
(any related inquiries can be sent to register@mos-ak.org)

Postworkshop Publications:

Selected best MOS-AK technical presentation will be recommended for further publication
in a special issue of the International Journal of High Speed Electronics and Systems

Extended MOS-AK Committee

WG080717

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[paper] A Compact Model for the Statistics of the Low-Frequency Noise of MOSFETs With Laterally Uniform Doping

A Compact Model for the Statistics of the Low-Frequency Noise of MOSFETs With Laterally Uniform Doping

M. Banaszeski da Silva; H. P. Tuinhout; A. Zegers-van Duijnhoven; G. I. Wirth; A. J. Scholten;

in IEEE Transactions on Electron Devices, vol.PP, no.99, pp.1-6
doi: 10.1109/TED.2017.2713301

Abstract: In this paper, we develop a compact physics-based statistical model for random telegraph noise-related low-frequency noise in bulk MOSFETS with laterally uniform doping. The proposed model is suited for modern compact device models, such as PSP, BSIM, and EKV. With our proposed model, one can calculate the expected value and the variability of the noise as a function of bias and device parameters. We validate the model through numerous experimental results from different CMOS nodes, down to 40 nm. [read more...]

Multiple Honors for E3S Theme Leader, Professor Tsu-Jae King Liu

(March 1, 2017) –   The Center for Energy Efficient Electronics Science is proud to announce Prof. Tsu-Jae King Liu has been named a newly elected member of the National Academy of Engineering. Prof. King Liu, who leads the E³S Nanomechanics theme was elected this year as one of only three members from UC Berkeley to this highest professional honor to an engineer. Last year in August, Prof. King Liu has also been chosen to serve on the Board of Directors at Intel Corporation. She was welcomed by Intel Chairman Andy Bryant: “[Prof. King Liu] brings a wealth of expertise in silicon technology and innovation that will be valuable for Intel in many areas as we navigate a significant business transition while continuing to lead in advancing Moore’s Law and harnessing its economic value.”In addition to this distinguished honor by Intel, last year the Semiconductor Research Corporation (SRC) announced Prof. King Liu has been selected to receive the 2016 SRC Aristotle Award. This esteemed award was created by the SRC Board of Directors in March 1995 with the intent "to acknowledge outstanding teaching in its broadest sense, emphasizing student advising and teaching." Heartiest congratulations from the entire E³S community to Prof. King Liu for these prestigious honors!

[paper] Design Strategies for Ultralow Power 10nm FinFETs

Design Strategies for Ultralow Power 10nm FinFETs

Abhijeet Walkea^a, Garrett Schlenvogtb^b, Santosh Kurineca^a

^aDepartment of Electrical & Microelectronic Engineering, RIT, New York, USA

^bTCAD Application Engineer, Silvaco

Received 12 June 2017, Accepted 19 June 2017, Available online 20 June 2017

Abstract: In this work, new design strategies for 10nm node NMOS bulk FinFET transistors are investigated to meet low power (LP) (20pA/μm< I_OFF <50pA/μm) and ultralow power (ULP) (I_OFF <20pA/μm) requirements using three dimensional (3D) TCAD simulations. The punch-through stop implant, source and drain junction placement and gate workfunction are varied in order to study the impact on the OFF-state current (I_OFF), transconductance (g_m), gate capacitance (C_gg) and intrinsic frequency (f_T). It is shown that the gate length of 20nm for the 10nm node FinFET can meet the requirements of LP transistors and ULP transistors by source-drain extension engineering, punch-through stop doping concentration, and choice of gate workfunction.

[read more https://doi.org/10.1016/j.sse.2017.06.012]

Rising SOI tide lifts Soitec into profit

Soitec SA (Bernin, France), developer of the "smart cut" method of silicon-on-insulator (SOI) wafer production, has reported its first profit for many years and is preparing to invest in facilities in France and possibly Singapore to meet rising demand for SOI wafers...

https://shar.es/1BtAZy


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[C4P] IEDM 2017

2017 IEDM CALL FOR PAPERS

The Annual International Electron Devices Meeting will be held at the Hilton San Francisco Union Square San Francisco, CA December 2-6, 2017

Abstract Deadline (four page final paper): August 2nd, 2017

To provide faster dissemination of the conference’s cutting-edge results, the abstract submission deadline has been moved to August 2nd for submission of four-page, camera-ready abstracts. Accepted papers will be published as-is in the proceedings

A Call for Papers flyer is available here: IEDM 2017 Call For Papers.

Customized Call for Papers for each of the technical subcommittee areas are also available:

• Circuit and Device Interaction (CDI)
• Characterization, Reliability, and Yield (CRY)
• Compound Semiconductor and High Speed Devices (CHS)
• Memory Technology (MT)
• Modeling and Simulation (MS)
• Material and interface modeling 
• Compact models
• Kinetic Monte Carlo and Molecular Dynamics
• Reliability and variability modeling
• Technology benchmarking
  New or trending areas include:
• First principle based quantum transport
• Process simulation with atomistic methods
• Self heating, interconnect and packaging
• Nano Device Technology (NDT)
• Optoelectronics, Displays, and Imagers (ODI)
• Power Devices (PD)
• Process and Manufacturing Technology (PMT)
• Sensors, MEMS, and BioMEMS (SMB)

[paper] Well-Posed Device Models for Electrical Circuit Simulation

Well-Posed Device Models for Electrical CircuitSimulation
A Guide to Creating Robust Device Models
A. Gokcen Mahmutoglu, Tianshi Wang, Archit Gupta and Jaijeet Roychowdhury
March 25, 2017

Synopsis: This document provides guidelines for creating computational device models that work well in simulation. We build our discussion around the mathematical notion of “well-posedness”. We show that the requirements for a model to be well-posed stem from the internal working mechanisms of simulators. Therefore, our main aim is to provide insight into the numerical procedures used by simulators in order to help model developers avoid ill-posedness issues. We start our discussion with an example that shows how an ill-posed Verilog-A model can produce different simulation results in different simulators. We then provide a step-by-step simulation case study. In this case study, we illustrate the role of device models in simulations by examining the steps a simulator goes through, from taking a netlist as input to producing a simulation result as output. Finally, we distill our discussion in a functional definition of a well-posed model. As an extension to our theoretical discussion, we also provide practical guidelines that should be followed by Verilog-A models in order to avoid ill-posedness issues [read more...]

This document is published as a part of the Nano-Engineered Electronic Device Simulation (NEEDS) initiative. NEEDS is an NSF-funded initiative whose charter includes the development of tools and techniques for the production of high-quality device models¹:
NEEDS has a vision for a new era of electronics that couples the power of billion-transistor CMOS technology with the new capabilities of emerging nano-devices and a charter to create high-quality models and a complete development environment that enables a community of compact model developers.

NEEDS Team: Purdue, MIT, UC Berkeley, and Stanford.”

¹For more information about NEEDS please visit https://nanohub.org/groups/needs/.

[mos-ak] [Workshop Program] 2nd Sino MOS-AK Workshop in Hangzhou June 29-30, 2017

2nd Sino MOS-AK Workshop
Hangzhou June 29-30, 2017
Workshop Program online http://www.mos-ak.org/hangzhou_2017/

 
Together with the Honorary Committee Chair LingLing Sun, HangZhou Dianzi University and International MOS-AK Board of R&D Advisers: Larry Nagel, Omega Enterprises Consulting (USA), Andrei Vladimirescu, UCB (USA); ISEP (FR) as well as the local coordinator Min Zhang, XMOD (Shanghai) and all the Extended MOS-AK TPC Members, we have pleasure to invite to the 2nd Sino MOS-AK Workshop in Hangzhou on June 29-30, 2017. The MOS-AK workshop is organized with aims to strengthen a network and discussion forum among experts in the field, enhance open platform for information exchange related to the compact/SPICE modeling and its Verilog-A standardization, bring people in the compact modeling field together, as well as obtain feedback from technology developers, circuit designers, and CAD/EDA tool developers and vendors. 

Important Dates:

• 2nd Announcement - April 2017
• Final Workshop Program - June 2017
• 2nd Sino MOS-AK Workshop - June 29-30, 2017
• 1st Day MOS-AK Workshop
• 2nd Day MOS-AK Workshop

Venue:

会议场所：杭州电子科技大学科技馆
Hangzhou Dianzi University; Science & Technology Museum

Final Program of 2nd Sino MOS-AK Workshop is available online
http://www.mos-ak.org/hangzhou_2017/
http://www.xmodtech.cn/Agenda (local link)
Note: 
Above topic and time arrangement sequence could be with tiny variation due to presenter's personal reason
(演讲顺序可能有改变，敬请留意）

Online MOS-AK/Hangzhou Workshop Registration

http://www.xmodtech.cn/registration
(any related inquiries can be sent to register@mos-ak.org)

Postworkshop Publications:
Selected best MOS-AK technical presentation will be recommended for further publication
in a special issue of the International Journal of High Speed Electronics and Systems

Extended MOS-AK Committee

WG13062017

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Working Student in Power Management (Intel Munich)

Working Student in Power Management f/m

Job Description: You will be responsible for developing a tool framework to breakdown and manage the power consumption of the Power Management ICs across all projects. The so-called power KPIs Key Performance Indicator are indeed strategic data critical for the competitiveness of battery powered system likes mobiles phones, wearables, IoT devices. You will be part of an enthusiastic and international system engineering team located in Munich and will get in touch locally with several design and validation teams.

Your main tasks in this full time position will be to:
- Setup a new framework to manage the power data in a new tool and environment
- Migrate existing project power consumption specifications and measurements currently in Excel
- Measure and correlate power KPIs on engineering samples in the post-silicon lab.
- Validate current power modelling approach and propose further model optimizations
- Contribute to the reporting and documentation for other teams and management

[read more...]

A Guide to Creating Robust Device Models

Well-Posed Device Models for Electrical Circuit Simulation
A Guide to Creating Robust Device Models
A. Gokcen Mahmutoglu, Tianshi Wang, Archit Gupta and Jaijeet Roychowdhury
March 25, 2017

Synopsis: This document provides guidelines for creating computational device models that work well in simulation. We build our discussion around the mathematical notion of “well-posedness”. We show that the requirements for a model to be well-posed stem from the internal working mechanisms of simulators. Therefore, our main aim is to provide insight into the numerical procedures used by simulators in order to help model developers avoid ill-posedness issues. We start our discussion with an example that shows how an ill-posed Verilog-A model can produce different simulation results in different simulators. We then provide a step-by-step simulation case study. In this case study, we illustrate the role of device models in simulations by examining the steps a simulator goes through, from taking a netlist as input to producing a simulation result as output. Finally, we distill our discussion in a functional definition of a well-posed model. As an extension to our theoretical discussion, we also provide practical guidelines that should be followed by Verilog-A models in order to avoid ill-posedness issues.

This document is published as a part of the Nano-Engineered Electronic Device Simulation (NEEDS) initiative. NEEDS is an NSF-funded initiative whose charter includes the development of tools and techniques for the production of high-quality device models¹:

“NEEDS has a vision for a new era of electronics that couples the power of billion-transistor CMOS technology with the new capabilities of emerging nano-devices and a charter to create high-quality models and a complete development environment that enables a community of compact model developers.

NEEDS Team: Purdue, MIT, UC Berkeley, and Stanford.”

¹For more information about NEEDS please visit https://nanohub.org/groups/needs/
https://nanohub.org/resources/26200/download/well-posed_device_models-29453e4.pdf

[mos-ak] [C4P] IJHSES / MOS-AK Special Issue

The IJHSES Call for Papers

Special Issue on Advances in the Compact/SPICE Modeling

and its Verilog-A Standardization

Compact/SPICE models for circuit level simulation are essential element of supporting CAD/EDA tools for advanced integrated circuit designs. Rapid mainstream CMOS technology expansion and its scaling into the nanometer regime demands development of a fully physical as well as technology predictive compact/SPICE models for circuit simulation which provides adequate, full range DC, AC, RF, and noise characteristics and its geometry, bias, temperature scaling. These tasks becomes a major R&D challenge. Fast new technology nodes developments also impose new challenges on the compact/SPICE models maintenance and development as well as on its Verilog-A standardization for the model implementation, validation and dissemination.

Standard, core compact models should include and update noise/mismatch and reliability/variability models as well as proximity effects to adequately model nanoscale devices and technologies including nonclassical MOSFETs, multigate FinFETs and nanowire FETs partially/fully-depleted ultra thin body (UTB) SOI, and thin-film transistors (TFTs). High-frequency, high-voltage high-power, high-temperature devices have been extensively investigated, and their compact models to be reviewed, too. Heterogeneous integration opens a new perspectives to the CMOS platform to integrate different materials (III-V/Ge channel, organic and different source/drain injection mechanisms (Schottky-barrier, tunneling, junctionless FETs, and others) and new nonclassical devices, high GHz/THz range detectors, Bio/Med sensors, actuators, MEMS, among others, to support emerging device in future VLSI, IoT applications and beyond.

Therefore, there is an emerging need for an new special issue to review status, challenge and advancement in the compact/SPICE modeling for nanoscaled and emerging technologies as well as beyond. The IJHSES Editors seek original manuscripts for a special issue on advanced in the Compact/SPICE Modeling and its Verilog-A standardization.

Topics to be covered include the following, but are not limited to:

• Advances in semiconductor technologies and processing

• Compact Modeling (CM) of the electron devices

• Verilog-A language for CM standardization

• New CM techniques and extraction software

• FOSS TCAD/EDA modeling and simulation

• CM of passive, active, sensors and actuators

• Emerging Devices, TFT CMOS and SOI-based memory cells

• Organic, Bio/Med devices/technology modeling

• Microwave, RF device modeling, HV/Power device modeling

• Nanoscale CMOS devices and circuits

• Technology R&D, DFY, DFT and IC Designs

• Foundry/Fabless Interface Strategies

Paper Submission and Review Schedule:

• First call for papers:    April 2017

• Second announcement:    June 2017

• Special Issue Due:    Dec. 2017

IJHSES Editor-in-Chief	Co-Editors-in-Chiefs	Guest Editors
Michael Shur Rensselaer Polytechnic Institute (USA)	Wladek Grabinski MOS-AK Association (EU) Benjamin Iñiguez DEEEA, ETSE, URV (SP)	Jean-Michel Sallese EPFL Lausanne (CH) Daniel Tomaszewski ITE Warsaw (PL)

WG250417

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[mos-ak] [2nd Announcement and Call for Papers] 2nd Sino MOS-AK Workshop in Hangzhou (CN) June 29-30, 2017

2nd Sino MOS-AK Workshop  

  in Hangzhou (CN) June 29-30, 2017
     2nd Announcement and Call for Papers   

 
Together with Prof. LingLing Sun, HangZhou Dianzi University, the honorary MOS-AK workshop chair,  Dr. Min Zhang, XMOD (Shanghai), local workshop coordinator and International MOS-AK Board of R&D Advisers: Larry Nagel, Omega Enterprises Consulting (USA), Andrei Vladimirescu, UCB (USA); ISEP (FR) as well as all the Extended MOS-AK TPC Committee, we have pleasure to invite to the 2nd Sino MOS-AK Workshop which will be held at 会议场所：杭州电子科技大学科技馆 Hangzhou Dianzi University Science & Technology Museum on June 29-20, 2017 in Hangzhou (CN).

Planned MOS-AK workshop is organized with aims to strengthen a network and discussion forum among experts in the field, enhance open platform for information exchange related to compact/SPICE modeling and Verilog-A standardization, bring people in the compact modeling field together, as well as obtain feedback from technology developers, circuit designers, and CAD/EDA tool developers and vendors. 

Important Dates:

• Preannouncement - March 2016
  
• Call for Papers - April 24 2017
  
• Final Workshop Program - June. 2017
  
• MOS-AK Workshop - June 29-30, 2017

Venue:

会议场所：杭州电子科技大学科技馆
Hangzhou Dianzi University Science & Technology Museum
Hangzhou (CN)

Topics to be covered include the following among other related to the compact/SPICE modeling :

• Compact Modeling (CM) of the electron devices
  
• Advances in semiconductor technologies and processing
  
• Verilog-A language for CM standardization
  
• New CM techniques and extraction software
  
• Open Source TCAD/EDA modeling and simulation
  
• CM of passive, active, sensors and actuators
  
• Emerging Devices, TFT, CMOS and SOI-based memory cells
  
• Microwave, RF device modeling, high voltage device modeling
  
• Nanoscale CMOS devices and circuits
  
• Technology R&D, DFY, DFT and reliability/ageing IC Designs
  
• Foundry/Fabless Interface Strategies
  

Invited Speakers (tentative list in alphabetic order)

• Eric Leclerc, UMC Foundry (F)
• Ling Li, Chinese Academy of Sciences (CN)
• Helmut Puchner, Cypress Semi (US)
• Paulius Sakalas, TU Dresden (D)
• Pete Zampardi, RFMD (US)
• Thomas Zimmer, Uni. Bordeaux (F)

Online MOS-AK Abstract Submission:
Prospective authors should submit abstract online

Manuscript submission deadline: 29th May 2017 (Monday)
Notification of Acceptance: 5th June 2017 (Monday)
Submission of final manuscript: 19th June 2017 (Monday)

(any related inquiries can be sent to abstrscts@mos-ak.org)

Online Workshop Registration

using online registration form

(any related inquiries can be sent to register@mos-ak.org)

Postworkshop Publications:
Selected best MOS-AK technical presentation will be recommended for further publication
in a special issue of the International Journal of High Speed Electronics and Systems

Extended MOS-AK Committee

WG240417

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