Monday, March 16, 2015

[MOS-AK/DATE 2015 Workshop] CEA-Leti's predictive model takes FDSOI further

 CEA-Leti's predictive model takes FDSOI further 

During DATE 2015’s MOS-AK Workshop, CEA-Leti presented the newest version of its advanced compact model for ultra-thin body and buried oxide fully depleted SOI (UTBB-FDSOI) technology.

Fully Depleted Silicon On Insulator (FDSOI) is a planar process technology that relies on two primary innovations. First, an ultra-thin layer of insulator, called the buried oxide, is positioned on top of the base silicon.

Then, a very thin silicon film implements the transistor channel. Thanks to its thinness, there is no need to dope the channel, thus making the transistor fully depleted. The combination of these two innovations is called “ultra-thin body and buried oxide Fully Depleted SOI” or UTBB-FDSOI.

Back in 2013, CEA-Leti had deployed a first compact model, but working in close cooperation with STMicroelectronics, the research lab understood that more subtle back gate channelling effects had to be addressed to fully exploit the benefits of UTBB-FDSOI and to explore the transistors’ behaviour in more details.

New analytical equations were written from scratch for the Leti-UTSOI2.1 compact model, improving on the predictability and accuracy capabilities of the previous version, Leti-UTSOI2.

To date, other models from the University of Hiroshima, and from the University of Berkeley fail to account for inversion effects at the back interface, when a strong forward back bias (FBB) is applied, told us Thierry Poiroux, Leti research engineer and model co-developer.

More specifically, the French lab used a unique analytical resolution scheme for the calculation of surface potentials at both interfaces of the transistor body, offering a refined description of narrow-channel effects, with an improved accuracy of moderate inversion regime and gate tunnelling current modelling.

Because the model is analytical, it is much faster than any numerical simulation. It is now available in all major SPICE and Fast SPICE simulators through licences with EDA vendors and will allow fabless companies and IC designers to virtually explore different UTBB-FDSOI parameters within a given foundry process node. The new model can also be used by foundries and fabless companies to perform a predictive analysis of future nodes to come, in order to orient their ongoing process optimization.

for more information visit CEA-Leti at

Sunday, March 8, 2015

[BOOK] FinFET Modeling for IC Simulation and Design Using the BSIM-CMG Standard

 FinFET Modeling for IC Simulation and Design Using the BSIM-CMG Standard
 Yogesh Singh Chauhan, Darsen Lu, Sriramkumar Venugopalan, Sourabh Khandelwal, Juan Pablo Duarte, Navid Paydavosi, Ai Niknejad, Chenming Hu

DESCRIPTIONThis book is the first to explain FinFET modeling for IC simulation and the industry standard – BSIM-CMG - describing the rush in demand for advancing the technology from planar to 3D architecture, as now enabled by the approved industry standard. The book gives a strong foundation on the physics and operation of FinFET, details aspects of the BSIM-CMG model such as surface potential, charge and current calculations, and includes a dedicated chapter on parameter extraction procedures, providing a step-by-step approach for the efficient extraction of model parameters.

  • Learn how to do FinFET modeling using the BSIM-CMG standard from the experts
  • Authored by the lead inventor and developer of FinFET, and developers of the BSIM-CMG standard model, providing an experts’ insight into the specifications of the standard
  • The first book on the industry-standard FinFET model - BSIM-CMG
With this book you will learn:
  • Why you should use FinFET
  • The physics and operation of FinFET
  • Details of the FinFET standard model (BSIM-CMG)
  • Parameter extraction in BSIM-CMG
  • FinFET circuit design and simulation