Showing posts with label InP. Show all posts
Showing posts with label InP. Show all posts

Nov 11, 2021

[paper] InP HEMTs for future THz applications

J.Ajayana, D.Nirmalb, Ribu Mathewc, Dheena Kuriand, P.Mohankumare, L.Arivazhaganb, D.Ajithaf
A critical review of design and fabrication challenges in InP HEMTs 
for future terahertz frequency applications
Materials Science in Semiconductor Processing
Volume 128, 15 June 2021, 105753
  
a SR University, Warangal, Telangana, India
b Karunya Institute of Technology and Sciences, Coimbatore, Tamilnadu, India
c VIT Bhopal University, Bhopal, Madhya Pradesh, India
d Kerala Technological University, Trivandrum, Kerala, India
e Sona College of Technology, Salem, Tamilnadu, India
f Sreenidhi Institute of Science and Technology, Hyderabad, Telangana, India

Abstract: This article critically reviews the materials, processing and reliability of InP high electron mobility transistors (InP HEMTs) for future terahertz wave applications. The factors such as drain current (ID) over 1200 mA/mm, transconductance (gm) over 3000 mS/mm, cut off frequency (fT) over 700 GHz and maximum oscillation frequency (fmax) over 1300 GHz makes InP HEMTs suitable for Terahertz wave applications. Furthermore, low DC power consumption and outstanding low noise performance makes InP HEMT most appropriate transistor technology for the development of space based receivers. This review article critically assesses the challenges in miniaturization of InP HEMTs, doping strategies in InP HEMTs, buried platinum technology, impact of annealing process and temperature, influence of electron and proton irradiation, thermal and bias stress on the reliability of InP HEMTs, cavity and gating effects and influence of trapping effects. InP HEMTs are very much preferable in applications like radio astronomy, terahertz optical and wireless communication systems, atmospheric imaging and sensing, automotive radar, ground based receivers in deep space networks, terahertz imaging and sensing, biomedical applications, security screening, video conferencing & real time multimedia file transfer, high speed and ultra low power digital integrated circuits.

Fig: 3D representation of InP high electron mobility transistor (InP HEMT)







Apr 20, 2021

[papers] Compact Modeling

[1] Nicolo Zagni; Simulation and Modeling Methods for Predicting Performance and Reliability Limits of 21st-Century Electronics; PhD Thesis, Universita Degli Estudi Di Modena e Reggio Emilia; Anno Accademico 2019–2020 (CICLO XXXIII)

Abstract: In recent years, a plethora of novel semiconductor devices have started emerging as worthy heirs of Silicon-based transistors – giving rise to the ’post-Moore’ era. Traditional electronics is mostly based on Si devices, – from logic to memory, to high frequency/power and sensing applications – but this paradigm is changing thanks to the developments in different fields ranging from physics and semiconductor materials, to processing techniques and computing architectures. In this hectic new scenario, before even considering a new technology as a replacement of the existing ones, the limiting factors to its performance and reliability need to be well-understood and engineered for. In this sense, simulations and physics-based modeling represent critical tools to make sure that newly conceived technologies stand up to the requirements of 21st century electronics. In this thesis, state-of-the-art simulation and compact modeling tools are exploited to analyze the performance and reliability limits of several emerging technologies. Specifically, this dissertation is focused on four application scenarios and the relative candidate technologies that aim to providing enhanced performance/reliability compared to Si-based counterparts. These are: i) III-V MOSFETs for logic/digital circuits, ii) resistive-RAMs and ferroelectric-FETs for non-volatile memory and in-memory computing, iii) GaN-based high-speed transistors for power applications, and iv) negative capacitance transistors for biosensing.

Fig: Energy bandgap (Eg) vs lattice constant (a) of different semiconductor materials, showing that In0.57Ga0.43As has the same lattice constant as InP. Adapted from: https://www.iue.tuwien.ac.at/phd/brech/diss.htm (visited on 12/20/2020).

[2] G. Maroli, A. Fontana, S. M. Pazos, F. Palumbo and P. Julián, "A Geometric Modeling Approach for Flexible, Printed Square Planar Inductors under Stretch," 2021 Argentine Conference on Electronics (CAE), Bahia Blanca, Argentina, 2021, pp. 61-66, DOI: 10.1109/CAE51562.2021.9397568.

Abstract: In this work a compact model for square planar inductors printed on flexible substrate is proposed. The approach considers the deformation of the metal traces of square spiral inductors when the substrate is subjected to physical stretch. The model considers a typical pi-network for the device, where each component is calculated for different stretching values adapting widely accepted models on the literature for the total inductance, the AC resistance and the ground coupling and inter-wounding capacitances. Model results are contrasted to 3D full electromagnetic wave simulations under parametric sweeps of the dimensions calculated under stretch. Results show good agreement within a 20 % stretch up to the first resonance frequency of the structure. The model can prove useful for the optimization of component design for printed applications on flexible substrates.


[3] H. Kikuchihara et al., "Modeling of SJ-MOSFET for High-Voltage Applications with Inclusion of Carrier Dynamics during Switching," 2021 International Symposium on Devices, Circuits and Systems (ISDCS), Higashihiroshima, Japan, 2021, pp. 1-4, DOI: 10.1109/ISDCS52006.2021.9397904.

Abstract: Demands for higher-voltage MOSFET application are increasing, for which a Super-Junction MOSFET, sustaining the voltages in the range of 500V, has been developed based on the trench-type structure. Due to the huge bias applied, a new leakage-current type is induced during switching, which causes a switching-power-loss increase. Creating a compact model for circuit design, which includes this additional leakage current, is the purpose of the present development. The model describes the depletion-width variation, caused during the switching-on of the device, with the use of the internal node potential, determined accurately by iteration. It is verified, that the new compact model can accurately predict the device performances for different device structures. This capability can be used for device optimization to realize low-power circuitry.




Oct 30, 2020

[PhD Thesis] III-V MOS-HEMTs for 100-340GHz Communications Systems

UNIVERSITY OF CALIFORNIA
Santa Barbara
III-V InxGa1-xAs / InP MOS-HEMTs for 100-340GHz Communications Systems
A dissertation for PhD degree in Electrical and Computer Engineering
by Brian David Markman

Abstract: This work summarizes the efforts made to extend the current gain cutoff frequency of InP based FET technologies beyond 1THz. Incorporation of a metal-oxide-semiconductor field effect transistor (MOSFET) at the intrinsic Gate Insulator-Channel interface of a standard high electron mobility transistor (HEMT) has enabled increased gm,i by increasing the gate insulator capacitance density for a given gate current leakage density. Reduction of RS,TLM from 110 Ω.μm to 75Ω.μm and Ron(0) from 160Ω.μm to 120Ω.μm was achieved by removing/thinning the wide bandgap modulation doped link regions beneath the highly doped contact layers. Process repeatability was improved by developing a gate metal first process and Dit was improved by inclusion of a post-metal H2 anneal. InxGa1-xAs / InAs composite quantum wells clad with both InP and InxAl1-xAs were developed for high charge density and low sheet resistance to minimize source resistance. 
Figure a) InP-based HEMT b) III-V DC optimized MOSFET c) proposed InP-based MOS-HEMT

[Citation] Markman, B. D. (2020). III-V InxGa1-xAs / InP MOS-HEMTs for 100-340GHz Communications Systems. UC Santa Barbara. ProQuest ID: Markman_ucsb_0035D_14853. Merritt ID: ark:/13030/m5v4681j. Retrieved from https://escholarship.org/uc/item/6st812pb

Oct 21, 2020

[Survey] Power Amplifiers Performance 2000-Present

Fifth web release on 2020/10/15: "PA_Survey_v5". This version-5 dataset includes PAs/transmitters from 500MHz to 1.5 THz in Bulk/SOI CMOS, SiGe, LDMOS, InP, GaN, GaAs technologies. The dataset contains total 3207 data points with over 1200 data points for CMOS, SiGe PAs and over 1500 data points for GaN, GaAs, InP PAs.

We have added sub-THz/THz power/signal generation circuits from 15GHz to 1.5THz, including PAs, fundamenal/harmonic oscillators, and frequency multipliers, to support the emerging research on beyond-5G/6G applications.

The file "PA_Survey_v5" is the version-5 dataset that includes ALL the reported PA/transmitter data since 2000 over frequency and various technologies. It also includes summary plots on CW Psat vs. Carrier Frequency for different technologies, peak PAE vs. CW Psat at different frequencies, and average PAE vs. average Pout for high-order complex modulations.

What is new in version-5 release beyond the version-4 release? 500MHz to 1.5 THz Power Amplifier designs and sub-THz/THz power/signal generation circuits published between 02/2020 and 10/2020.

  • Cite this PA survey: Hua Wang, Tzu-Yuan Huang, Naga Sasikanth Mannem, Jeongseok Lee, Edgar Garay, David Munzer, Edward Liu, Yuqi Liu, Bryan Lin, Mohamed Eleraky, Sensen Li, Fei Wang, Amr S. Ahmed, Christopher Snyder, Sanghoon Lee, Huy Thong Nguyen, and Michael Edward Duffy Smith, "Power Amplifiers Performance Survey 2000-Present," [Online]. Available: https://gems.ece.gatech.edu/PA_survey.html
  • Acknowledgement: We would like to sincerely thank many of our friends and colleagues for their helpful suggestions and insightful discussions.
  • Feedback and Suggestions: We welcome your feedback and suggestions, including the ways to interpret and present the data. In addition, although we try to be as inclusive as possible when collecting these published data, it is certainly possible that we may miss some representative PA designs. Please feel free to send us feedback, suggestions, or missing PA papers.
  • Contact: Please contact us through poweramplifiers.survey at gmail dot com. Do not use my gatech email address, since I may very likely miss your email.
  • Source for this data collection: We focus on peer-reviewed and publicly accessible publications that are typical forums for PAs, including IEEE ISSCC, JSSC, RFIC, VLSI, CICC, ESSCIRC, IMS, T-MTT, TCAS, BCTM/CSICS (BCICTS in the future), APMC, EuMC, and MWCL. We also focus on public product datasheets on PAs/transmitters.