Apr 24, 2020

#paper: L. Liu, W. Chen, X. Liu and G. Du, "Photoelectric Characteristic Evaluation of Different Structured UTBB MOSFETs," in IEEE TED, vol. 67, no. 5, pp. 1919-1923, May 2020 https://t.co/2onkfigdMS https://t.co/XWNv6uZML9


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April 24, 2020 at 05:49PM
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Online Classes on The Principle of Semiconductor Devices

Professor Mansun Chan, UST (HK), has developed a 13 weeks online class on the principle of semiconductor devices.  Unlike tradition lectures, the class use extensive animations to help students to visualize the actions of carriers in a device.  The classes was divided into two part, part I on semiconductor carrier statistics, PN Junction, BJT and part II on MOSFET and advanced FET.


Meet your instructor:

Mansun Chan
Chair Professor, Department of Electronic and Computer Engineering
The Hong Kong University of Science and Technology


conference FOSS paper reached 300 reads


D. Tomaszewski, G. Głuszko, M. Brinson, V. Kuznetsov and W. Grabinski, "FOSS as an efficient tool for extraction of MOSFET compact model parameters," 2016 MIXDES - 23rd International Conference Mixed Design of Integrated Circuits and Systems, Lodz, 2016, pp. 68-73.

Abstract - A GNU Octave - based application for device-level compact model evaluation and parameter extraction has been developed. The applications main features are as follows: experimental I–V data importing, generating input data for different circuit simulation programs, running the simulation program to calculate I–V characteristics of the specified models, calculating model misfit and its sensitivity to selected parameter variation, and the comparison of experimental and simulated characteristics. Measured I–V data stored by different measurement systems are accepted. Circuit simulations may be done with Ngspice, Qucs and LTSpiceIV © . Selected aspects of the application are presented and discussed.

Apr 20, 2020

Pokit PRO. Multimeter, Oscilloscope & Logger https://t.co/m65iiW8ckl #paper https://t.co/qAYsVIiW7m


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April 20, 2020 at 02:23PM
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#paper: J. Li, Z. Chen, Y. Qu and R. Zhang, "Traps Around Ge Schottky Junction Interface: Quantitative Characterization and Impact on the Electrical Properties of Ge MOS Devices," in IEEE J-EDS, vol. 8, pp. 350-357, 2020 https://t.co/zD5bzZH2cN https://t.co/g7qcnAGtjM


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April 20, 2020 at 10:49AM
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