Mar 23, 2020

[paper] Charge-based Modeling of Ultra Narrow Cylindrical Nanowire FETs

Charge-based Modeling of Ultra Narrow Cylindrical Nanowire FETs 
Danial Shafizade, Majid Shalchian and Farzan Jazaeri
IEEE TED, Vol. XX, No. XX, 15 March 2020

Abstract: This brief proposes an analytical approach to model the dc electrical behavior of extremely narrow cylindrical junctionless nanowire field-effect transistor (JLNW-FET). The model includes explicit expressions, taking into account the first order perturbation theory for calculating eigenstates and corresponding wave functions obtained by the Schrodinger equation in the cylindrical coordinate. Assessment of the proposed model with technology computer-aided design (TCAD) simulations and measurement results confirms its validity for all regions of operation. This represents an essential step toward the analysis of circuits mainly biosensors based on junctionless nanowire transistors.

MicroTec: Semiconductor Process and Device Simulator

Software Package for 2D Process and Device Simulation
Version 4.0 for Windows
User’s Manual
Publisher: Siborg Systems Inc
Editor: Michael S. Obrecht

MicroTec allows 2D silicon process modeling including implantation, diffusion and oxidation and 2D steady-state semiconductor device simulation like MOSFET, DMOS, JFET, BJT, IGBT, Schottky, photosensitive devices etc. Although MicroTec is significantly simplified compared to widely available commercial simulators, it nevertheless is a very powerful modeling tool for industrial semiconductor process/device design. In many instances MicroTec outperforms existing commercial tools and it is remarkably robust and easy-to-use.

FIG: MicroTec SibGraf GUI windows




#paper: J. N. Ramos-Silva, A. Pacheco-Sinchez, M. A. Enciso-Aguilar, D. Jimenez, E. Ramirez-Garcia: Small-signal parameters extraction and noise analysis of CNTFETs, IOPscience SST 35(4), 045024 (Mar 2020) doi:10.1088/1361-6641/ab760b https://t.co/vY5g9t4h1B https://t.co/L00nT1AkMS


from Twitter https://twitter.com/wladek60

March 23, 2020 at 11:01AM
via IFTTT

Mar 19, 2020

#XFAB Further Expands its #SiC Capacity and Adds New In-House Epitaxy Capabilities https://t.co/1ZecCr6k92 #paper https://t.co/5RCDzb1cbv


from Twitter https://twitter.com/wladek60

March 19, 2020 at 11:30AM
via IFTTT

[paper] Negative Capacitance Double-Gate JunctionlessFETs


Negative Capacitance Double-Gate JunctionlessFETs: A Charge-based Modeling Investigation of Swing, Overdrive and Short Channel Effect
Amin Rassekh, Jean-Michel Sallese, Farzan Jazaeri, Morteza Fathipour and Adrian M. Ionescu
IEEE TED, Vol. XX, No. XX, March 3, 2020

Abstract: In this paper, an analytical predictive model of the negative capacitance (NC) effect in symmetric long channel double-gate junctionless transistor is proposed based on a charge-based model. In particular, we have investigated the effect of the thickness of the ferroelectricon the I-V characteristics. Importantly, for the first time,our model predicts that the negative capacitance minimizes short channel effects and enhances current over-drive, enabling both low power operation and more efficient transistor size scaling, while the effect on reducing subthreshold slope shows systematic improvement, with subthermionic subthreshold slope values at high current levels (0.1 μA/μm). Our predictive results in a long channel junctionless with NC show an improvement in ON current by a factor of 6 in comparison to junctionless FET. The set of equations can be used as a basis to explore how such a technology booster and its scaling will impact the main figures of merit of the device in terms of power performances and gives a clear understanding of the device physics. The validity of the analytical model is confirmed by extensive comparisons with numerical TCAD simulations in all regions of operation, from deep depletion to accumulation and from linear to saturation.
Fig: The difference of the potential across the ferroelectric (left axis) and the difference of total charge density of ferroelectric (right axis) in high VDS and low VDS versus the channel length. ∆Vf somehow represents ∆VG (The difference of VG in high and low VDS). The inset illustrates the schematic of the I-V characteristic of a regular double gate JLFET and a double gate JLFET with negative capacitance at low and high VDS.