Showing posts with label electrostatic doping. Show all posts
Showing posts with label electrostatic doping. Show all posts

Jan 5, 2022

[paper] A Review of Sharp-Switching Band-Modulation Devices

Sorin Cristoloveanu1, Joris Lacord2, Sébastien Martinie2, Carlos Navarro3, Francisco Gamiz3, Jing Wan4, Hassan El Dirani1, Kyunghwa Lee1 and Alexander Zaslavsky5
A Review of Sharp-Switching Band-Modulation Devices
Micromachines 2021, 12, 1540.
DOI: 10.3390/mi12121540
   
1 IMEP-LAHC, Université Grenoble Alpes (F)
2 CEA, LETI, MINATEC Campus (F)
3 CITIC-UGR, University of Granada (SP)
4 Fudan University, Shanghai (CN)
5 Brown University, Providence (US)


Abstract: This paper reviews the recently-developed class of band-modulation devices, born from the recent progress in fully-depleted silicon-on-insulator (FD-SOI) and other ultrathin-body technologies, which have enabled the concept of gate-controlled electrostatic doping. In a lateral PIN diode, two additional gates can construct a reconfigurable PNPN structure with unrivalled sharp-switching capability. We describe the implementation, operation, and various applications of these band-modulation devices. Physical and compact models are presented to explain the output and transfer characteristics in both steady-state and transient modes. Not only can band-modulation devices be used for quasi-vertical current switching, but they also show promise for compact capacitorless memories, electrostatic discharge (ESD) protection, sensing, and reconfigurable circuits, while retaining full compatibility with modern silicon processing and standard room-temperature low-voltage operation.


Fig: Average subthreshold swing SS vs. normalized ION plot. 
Green points indicate CMOS-compatible materials.

Acknowledgements: The European authors are grateful for support from the EU project REMINDER (H2020-687931). Alexander Zaslavsky acknowledges the support of the U.S. National Science Foundation (award QII-TACS-1936221).