[mos-ak] MOS-AK/GSA Seville Workshop on-line Publications

MOS-AK/GSA Seville workshop on-line publications are available:
http://www.mos-ak.org/seville/

More that 50 registered participants followed 2 keynote invited
presentations, 7 technical compact modeling talks as well as 15 poster
presentation at the MOS-AK/GSA ESSEDERC/ESSCIRC Compact Modeling
Workshop. I would like to thank all MOS-AK/GSA speakers and poster
presenters for sharing their compact modeling competence, R&D
experience and delivering valuable MOS-AK/GSA presentations. I am
sure, that our modeling event in Seville was beneficial to all MOS-AK
Workshop attendees.

Please note that as a result of post workshop discussion, the Dolphin
Verilog-A Compact Model Coding Whitepaper is available for direct
download:
http://www.dolphin-integration.com/medal/smash/notes/Verilog_A_Compact_Model_Coding_Whitepaper.pdf

Organization of our modeling event would not be possible without our
generous sponsors: Cascade Microtech and X-FAB Semiconductor Foundries
as well as the IEEE EDS, technical co-sponsor. I also would like to
personally acknowledge local ESSDERC/ESSCIRC organizers, in
particular, Professors Manuel Delgado Restituto, Andrés Godoy, the
ESSDERC/ESSCIRC Tutorials & Workshops Chairs for their dedication,
commitment. My very special 'thank you' goes also to Susana Eiroa for
her assistance and providing smooth workshop logistics.

I hope, we would have a next chance to meet us with your academic and
industrial partners at future MOS-AK/GSA modeling events (check the
list below).

- with regards - WG (for the MOS-AK/GSA Committee)
––––––––––––––––––––––––––––––––––
MOS-AK/Seville on-line publications <http://mos-ak.org/seville>
MOS-AK/California (Dec.2010; IEDM time frame)
IWCM at ASP-DAC in Yokohama Jan.2011 (with MOS-AK Support)
MOS-AK/Paris at LIP6 (March/April 2011)
MIXDES in Gliwice June 16-18, 2011 (with MOS-AK Session)
MOS-AK/Helsinki Sept.16, 2011 (ESSDERC time frame)
––––––––––––––––––––––––––––––––––

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CEA-Leti Makes a R&D 20nm Fully Depleted SOI Process available through CMP

Grenoble, FRANCE, and Tokyo, JAPAN, October 1st , 2010, CEA-Leti and CMP (Circuits Multi Projets®) announced during the FDSOI Workshop at Tokyo University the launch of an Exploratory MPW (Multi Project Wafers) initiative based on FDSOI (Fully Depleted SOI) 20nm process, opening the access of its 300mm infrastructure to the design community. This MPW offer is partly supported by EUROSOI+ network that gathers the main European academic partners on SOI.

The basis of the Fully Depleted SOI 20nm technology offer will be the following:

• CMOS transistors with an undoped channel and a silicon film thickness of 6nm
• High-k / Metal Gate stack
• Single threshold voltage (Vth) n- and p-MOSFET with balanced Vth of ±0.4V
• Associated Design Kit, including SPICE model (Verilog-A language), model cards extracted from silicon data, p-cells, DRC, LVS, schematic, parasitics
• Design Kit documentation

CMP Press Contacts:

Bernard Courtois +33 4 76 57 46 15

Kholdoun Torki +33 4 76 57 47 63

Shipments of silicon for semiconductor manufacturing raise more than 23%

I copy part of a post from EDN:

Shipments of silicon for semiconductor manufacturing in 2010 will grow by 23.6% year-over-year, reaching 8.9 billion total square inches, according to iSuppli estimates.

Global silicon shipments in terms of square inches are bouncing back in 2010, after suffering like most segments did in the 2008/2009 economy.

That's according to a report from iSuppli Corp, which estimated shipments will rise to record levels in 2010.

Shipments of silicon for semiconductor manufacturing in 2010 will grow by 23.6% year-over-year, reaching 8.9 billion total square inches, up from 7.2 billion square inches in 2009, iSuppli forecast. Growth is expected to continue and iSuppli projected that by 2014 12.4 billion total square inches of silicon will be shipped.

read more here....

Ten Years of Scaling

[source http://dger.at/2XTq]

Nano antenna concentrates light

Condensed matter physicist Doug Natelson and graduate student Dan Ward have found a way to make an optical antenna from two gold tips separated by a nanoscale gap that gathers light from a laser. The tips "grab the light and concentrate it down into a tiny space," Natelson said, leading to a thousand-fold increase in light intensity in the gap. [more]