Showing posts with label Ultra Low Power. Show all posts
Showing posts with label Ultra Low Power. Show all posts

May 30, 2023

[PhD Thesis] Digital-based analog processing in nanoscale CMOS ICs for IoT applications

Digital-based analog processing in nanoscale CMOS ICs for IoT applications
http://hdl.handle.net/10183/249786
PhD Cadndiate: Pedro Filipe Leite Correia De Toledo
Universidade Federal do Rio Grande do Sul. Instituto de Informática
Programa de Pós-Graduação em Microeletrônica.
Advisor: Klimach, Hamilton Duarte
Co-advisor: Crovetti, Paolo Stefano

Abstract: The Internet-of-Things (IoT) concept has been opening up a variety of applications, such as urban and environmental monitoring, smart health, surveillance, and home automation. Most of these IoT applications require more and more power/area efficient Complemen ary Metal–Oxide–Semiconductor (CMOS) systems and faster prototypes (lower time-to market), demanding special modifications in the current IoT design system bottleneck: the analog/RF interfaces. Specially after the 2000s, it is evident that there have been significant improvements in CMOS digital circuits when compared to analog building blocks. Digital circuits have been taking advantage of CMOS technology scaling in terms of speed, power consumption, and cost, while the techniques running behind the analog signal processing are still lagging. To decrease this historical gap, there has been an increasing trend in finding alternative IC design strategies to implement typical analog functions exploiting Digital in-Concept Design Methodologies (DCDM). This idea of re-thinking analog functions in digital terms has shown that Analog ICs blocks can also avail of the feature-size shrinking and energy efficiency of new technologies. This thesis deals with the development of DCDM, demonstrating its compatibility for Ultra-Low-Voltage (ULV) and Power (ULP) IoT applications. This work proves this statement through the proposing of new digital-based analog blocks, such as an Operational Transconductance Amplifiers (OTAs) and an ac-coupled Bio-signal Amplifier (BioAmp). As an initial contribution, for the first time, a silicon demonstration of an embryonic Digital-Based OTA (DB-OTA) published in 2013 is exhibited. The fabricated DB-OTA test chip occupies a compact area of 1,426 µm2 , operating at supply voltages (VDD) down to 300 mV, consuming only 590 pW while driving a capacitive load of 80pF. With a Total Harmonic Distortion (THD) lower than 5% for a 100mV input signal swing, its measured small-signal figure of merit (FOMS) and large-signal figure of merit (FOML) are 2,101 V −1 and 1,070, respectively. To the best of this thesis author’s knowledge, this measured power is the lowest reported to date in OTA literature, and its figures of merit are the best in sub-500mV OTAs reported to date. As the second step, mainly due to the robustness limitation of previous DB-OTA, a novel calibration-free digital-based topology is proposed, named here as Digital OTA (DIG OTA). A 180-nm DIGOTA test chip is also developed exhibiting an area below the 1000 µm2 wall, 2.4nW power under 150pF load, and a minimum VDD of 0.25 V. The proposed DIGOTA is more digital-like compared with DB-OTA since no pseudo-resistor is needed. As the last contribution, the previously proposed DIGOTA is then used as a building block to demonstrate the operation principle of power-efficient ULV and ultra-low area (ULA) fully-differential, digital-based Operational Transconductance Amplifier (OTA), suitable for microscale biosensing applications (BioDIGOTA) such as extreme low area Body Dust. Measured results in 180nm CMOS confirm that the proposed BioDIGOTA can work with a supply voltage down to 400 mV, consuming only 95 nW. The BioDIGOTA layout occupies only 0.022 mm2 of total silicon area, lowering the area by 3.22X times compared to the current state of the art while keeping reasonable system performance, such as 7.6 Noise Efficiency Factor (NEF) with 1.25 µVRMS input-referred noise over a 10 Hz bandwidth, 1.8% of THD, 62 dB of the common-mode rejection ratio (CMRR) and 55 dB of power supply rejection ratio (PSRR). After reviewing the current DCDM trend and all proposed silicon demonstrations, the thesis concludes that, despite the current analog design strategies involved during the analog block development

Fig: a) analog design octagon; b) gm/ID·fT versus the inversion coefficient IC, λc is the parameter corresponding to the fraction of the channel in which the carrier drift velocity reaches the saturated velocity over a portion of the channel geometrical length; c) Performance difference between analog and digital blocks over time; d) Area reduction over the years of the bitcell SRAM, OTA and bandgap reference

Nov 15, 2021

[book] Future Ultra Low Power Electronics

Semiconductor Devices and Technologies for Future Ultra Low Power Electronics (1st ed.)
Nirmal, D., Ajayan, J., & Fay, P.J. (Eds.)
CRC Press. (2021).
DOI: 10.1201/9781003200987

Abstract: This book covers the fundamentals and significance of 2-D materials and related semiconductor transistor technologies for the next-generation ultra low power applications. It provides comprehensive coverage on advanced low power transistors such as NCFETs, FinFETs, TFETs, and flexible transistors for future ultra low power applications owing to their better subthreshold swing and scalability. In addition, the text examines the use of field-effect transistors for biosensing applications and covers design considerations and compact modeling of advanced low power transistors such as NCFETs, FinFETs, and TFETs. TCAD simulation examples are also provided. 

Contents:
Preface vii
Editors ix
Contributors xi
Chapter 1: An Introduction to Nanoscale CMOS Technology Transistors: A Future Perspective; pp: 1
Kumar Prasannajit Pradhan
Chapter 2: High-Performance Tunnel Field-Effect Transistors (TFETs) for Future Low Power Applications; pp: 29
Ribu Mathew, Ankur Beohar, and Abhishek Kumar Upadhyay
Chapter 3: Ultra Low Power III-V Tunnel Field-Effect Transistors; pp: 59
J. Ajayan and D. Nirmal
Chapter 4: Performance Analysis of Carbon Nanotube and Graphene Tunnel Field-Effect Transistors; pp: 87
K. Ramkumar, Singh Rohitkumar Shailendra, and V. N. Ramakrishnan
Chapter 5: Characterization of Silicon FinFETs under Nanoscale Dimensions; pp: 115
Rock-Hyun Baek and Jun-Sik Yoon
Chapter 6: Germanium or SiGe FinFETs for Enhanced Performance in Low Power Applications; pp: 129
Nilesh Kumar Jaiswal and V. N. Ramakrishnan
Chapter 7: Switching Performance Analysis of III-V FinFETs .; pp: 155
Arighna Basak, Arpan Deyasi, Kalyan Biswas, and Angsuman Sarkar
Chapter 8: Negative Capacitance Field-Effect Transistors to Address the Fundamental Limitations in Technology Scaling; pp: 187
Harsupreet Kaur
Chapter 9: Recent Trends in Compact Modeling of Negative Capacitance Field-Effect Transistors; pp: 203
Shubham Tayal, Shiromani Balmukund Rahi, Jay Prakash Srivastava, and Sandip Bhattacharya
Chapter 10 Fundamentals of 2-D Materials; pp: 227
Ganesan Anushya, Rasu Ramachandran, Raj Sarika, and Michael Benjamin
Chapter 11 Two-Dimensional Transition Metal Dichalcogenide (TMD) Materials in Field-Effect Transistor (FET) Devices for Low Power Applications; pp 253
R. Sridevi and J. Charles Pravin
Index pp: 289