Flow-chart of BSIM to EKV conversion steps (source: D. Stefanovic and M. Kayal “Structured Analog CMOS Design" Springer Publications, 2008) |
Feb 8, 2018
BSIM3v3 to EKV2.6 Model Parameter Extraction
Meet #India’s women #opensource warriors https://t.co/OmYxPwCdlg https://t.co/KdqUF66d4E
Meet #India’s women #opensource warriors https://t.co/OmYxPwCdlg pic.twitter.com/KdqUF66d4E
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February 08, 2018 at 02:56PM
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ASAP7 predictive design kit development and cell design technology co-optimization: V. Vashishtha, M. Vangala and L. T. Clark, Invited #paper ICCAD, Irvine, CA, 2017 https://t.co/DS9MHtX5H4
ASAP7 predictive design kit development and cell design technology co-optimization: V. Vashishtha, M. Vangala and L. T. Clark, Invited #paper ICCAD, Irvine, CA, 2017 https://t.co/DS9MHtX5H4
— Wladek Grabinski (@wladek60) February 8, 2018
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February 08, 2018 at 02:01PM
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Feb 3, 2018
Assessing the impact of temperature and voltage variations in near-threshold circuits using an analytical #model... https://t.co/8wb8YJas8V
Assessing the impact of temperature and voltage variations in near-threshold circuits using an analytical #model... https://t.co/8wb8YJas8V
— Wladek Grabinski (@wladek60) February 3, 2018
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February 03, 2018 at 11:45AM
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Assessing the impact of temperature and voltage variations in near-threshold circuits using an analytical #model https://t.co/t0nkAEKBcw https://t.co/Av6FzcFvip
Assessing the impact of temperature and voltage variations in near-threshold circuits using an analytical #model https://t.co/t0nkAEKBcw pic.twitter.com/Av6FzcFvip
— Wladek Grabinski (@wladek60) February 3, 2018
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February 03, 2018 at 11:45AM
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Feb 1, 2018
F. Rasheed, M. S. Golanbari, G. Cadilha Marques, M. B. Tahoori and J. Aghassi-Hagmann, "A Smooth EKV-Based DC #Model for Accurate Simulation of Printed Transistors and Their Process Variations," in IEEE TED, vol. 65, no. 2, pp. 667-673, Feb. 2018.https://t.co/vQ0xogjSx4
F. Rasheed, M. S. Golanbari, G. Cadilha Marques, M. B. Tahoori and J. Aghassi-Hagmann, "A Smooth EKV-Based DC #Model for Accurate Simulation of Printed Transistors and Their Process Variations," in IEEE TED, vol. 65, no. 2, pp. 667-673, Feb. 2018.https://t.co/vQ0xogjSx4
— Wladek Grabinski (@wladek60) February 1, 2018
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February 01, 2018 at 07:56PM
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Jan 30, 2018
Extraction of #Process #Variation Parameters in FinFET Technology Based on #Compact #Modeling and... https://t.co/vqTFtfDxWG
Extraction of #Process #Variation Parameters in FinFET Technology Based on #Compact #Modeling and... https://t.co/vqTFtfDxWG
— Wladek Grabinski (@wladek60) January 30, 2018
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January 30, 2018 at 03:51PM
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