Nov 2, 2010

[mos-ak] C4P MOS-AK/GSA Workshop in San Francisco on December 8th, 2010

C4P MOS-AK/GSA Workshop in San Francisco on December 8th, 2010
http://www.mos-ak.org/california/

We, together with the lead sponsors Accelicon Technologies and Cascade
Microtech, are delighted to declare that we have confirmed a first-
class location for the MOS-AK/GSA Workshop in San Francisco on
December 8th, 2010: the JW Marriott Union Square <http://
www.marriott.com/hotels/travel/sfojw-jw-marriott-san-francisco-union-square/>.
Attendees will need to secure their own lodging and transportation to
the event. The JW Marriott is centrally located near Union Square,
near IEDM, and public transportation is abundant.

The MOS-AK/GSA Workshop in San Francisco will be organized as in the
timeframe of the IEDM and CMC Meetings. The MOS-AK/GSA Workshop is
HiTech forum to discuss the frontiers of the electron devices modeling
with emphasis on simulation-aware models. Original papers presenting
new developments and advances in the compact/spice modeling and its
Verilog-A standardization are solicited. Suggested topics include (but
are not limited to):
* Compact Modeling (CM) of the electron devices
* Verilog-A language for CM standardization
* New CM techniques and extraction software
* CM of passive, active, sensors and actuators
* Emerging Devices, CMOS and SOI-based memory cells
* Microwave, RF device modeling, high voltage device modeling
* Nanoscale CMOS devices and circuits
* Technology R&D, DFY, DFT and IC Designs
* Foundry/Fabless Interface Strategies

On-line abstract submission will be open on Nov.5, 2010.

Further details and updates http://www.mos-ak.org/california/

Local Organizing Committee:
Junko Nakaya, Cascade Microtech
Tim K.Smith, Accelicon Technologies

Extended MOS-AK/GSA Committee:
Jodi Shelton, President, Global Semiconductor Alliance (GSA)
Chelsea Boone GSA; Senior Research Analyst
Wladek Grabinski, GMC Suisse; MOS-AK/GSA Group Manager
MOS-AK/GSA North America:
Chair: Pekka Ojala, Exar Corporation
Co-Chair: Geoffrey Coram, Analog Devices
Co-Chair: Prof. Jamal Deen, U.McMaster
Co-Chair: Roberto Tinti, Agilent EEsof Division
MOS-AK/GSA South America:
Chair: Prof. Gilson I Wirth; UFRGS; Brazil
Co-Chair: Prof. Carlos Galup-Montor, UFSC; Brazil
Co-Chair: Sergio Bampi, UFRGS, Brazil
Co-Chair: Prof. Antonio Cerdeira Altuzarra, Cinvestav - IPN, Mexico
MOS-AK/GSA Europe:
Chair: Ehrenfried Seebacher, austriamicrosystems AG
Co-Chair: Alexander Petr, XFab
Co-Chair: Prof. Benjamin Iniguez, URV
Co-Chair: James Victory, Sentinel-IC
MOS-AK/GSA Asia/Pacific:
Chair: Goichi Yokomizo, STARC, Japan
Co-Chair: Sadayuki Yoshitomi, Toshiba, Japan
Co-Chair: Prof. Xing Zhou, NTU, Singapore
Co-Chair: Prof. A.B. Bhattacharyya, JIIT

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Oct 29, 2010

PRIME 2011 Conference

4-8 July 2011, Madonna di Campiglio (TN), Italy

The main objectives of PRIME 2011 Conference are:
  • to encourage favorable exposure to Ph.D. students in the early stages of their careers
  • to benchmark Ph.D. research in a friendly and cooperative environment
  • to enable sharing of student and supervisor experiences of scientific and engineering research
  • to connect Ph.D. students and their supervisors with companies and research centers
Paper Submission
The PRIME 2011 conference will allow only electronic submission of papers in PDF format (maximum file size must not exceed 2 Mbytes). Papers must not exceed four A4 pages with all illustrations and references included. The quality of the conference will be guaranteed by a thoroughly selected Technical Program Committee, which will provide detailed feedback to the authors. The accepted papers in the final camera ready format will be available on IEEE Xplore database. Papers submission will be opened during the first week of January, 2011. Manuscript guidelines as well as instructions on how to submit electronically your paper will be available soon on the conference web page.

E-mail: prime2011@fbk.eu
Website: http://prime2011.fbk.eu/

14 inch Transparent OLED Display Notebook from Samsung mobile

I couldn't resist the temptation to share this...

Oct 28, 2010

TriQuint rolls new GaAs foundry process

RF chip maker TriQuint Semiconductor Inc. has released its latest 150-mm gallium arsenide (GaAs) commercial foundry process. The process, dubbed TQP15, is targeted at the Ka-band segment. It is designed for building millimeter wave (mmWave) MMICs for applications such as VSAT, satellite communications and point to point radios [read more...]

Oct 27, 2010

New papers (October 27, 2010)

  • Why Quasi-Monte Carlo is Better Than Monte Carlo or Latin Hypercube Sampling for Statistical Circuit Analysis (abstract)
  • Separate Extraction of Source, Drain, and Substrate Resistances in MOSFETs With Parasitic Junction Current Method (abstract)
  • A Physics-Based Compact Model for Polysilicon Resistors (abstract)
  • The Equivalent-Thickness Concept for Doped Symmetric DG MOSFETs (abstract)
  • An Analytical I–V Model for Surrounding-Gate Transistors That Includes Quantum and Velocity Overshoot Effects (abstract)
  • Failure of the Scalar Dielectric Function Approach for the Screening Modeling in Double-Gate SOI MOSFETs and in FinFETs (abstract)
  • Device Physics and Characteristics of Graphene Nanoribbon Tunneling FETs (abstract)
  • Analytical Threshold Voltage Model Including Effective Conducting Path Effect (ECPE) for Surrounding-Gate MOSFETs (SGMOSFETs) With Localized Charges (abstract)

And other papers that I've found interesting:

  • Dual Threshold Voltage Organic Thin-Film Transistor Technology (abstract)
  • Complementary Organic Circuits Using Evaporated $ hbox{F}_{16}hbox{CuPc}$ and Inkjet Printing of PQT (abstract)
  • Low-Voltage High-Performance Pentacene Thin-Film Transistors With Ultrathin PVP/High- $kappa$ HfLaO Hybrid Gate Dielectric (abstract)
  • High-Performance Pentacene Thin-Film Transistors Fabricated by Organic Vapor-Jet Printing (abstract)
  • Magnetic-Field Area Sensor Using Poly-Si Micro Hall Devices (abstract)
  • On-Chip Aging Sensor Circuits for Reliable Nanometer MOSFET Digital Circuits (abstract)
  • On Undetectable Faults and Fault Diagnosis (abstract)

Oct 25, 2010

Job offers in LinkedIn: RF Modeling Device Engineer

Remember, this is only for information. We're not connected to them!

HIRING - Peregrine Semiconductor - RF Modeling Device Engineer

Click Here to Apply: https://home.eease.adp.com/recruit/?id=531727

Job Description:
This position is responsible for:
Member of team responsible for device modeling of Peregrine’s patented high-performance UltraCMOSTM silicon-on-sapphire CMOS process and packaging technology. The candidate will work closely with modeling engineers and CAD to support our design groups and external foundry customers.

Roles & Responsibilities will include:
• Responsible for modeling of passive components.
• Responsible for parasitic analysis of RF active components and BEOL.
• Model extraction for components on-wafer, modules, and packages.
• Manufacturing data analysis to develop statistical and corner models.
• Test chip DOE development, layout, and measurement.
• Provide guidance to design teams on best practice.


Qualifications:

Minimum Requirements:
• Ph.D. in Physics or Electrical Engineering (MS okay with demonstrated experience)
• Understanding of RF device performance metrics
• Experience using SPICE like circuit simulators to develop sub-circuit models.
• Experience using EM simulators (HFSS, Momentum, etc.) to study device performance.
• Demonstrated ability to extract models from measured data.
• Demonstrated problem solving skills.

The following traits are highly valued:
• Strong programming background and ability to develop automation scripts.
• Experience with Matlab, ICCAP, or other tool for model extraction.
• Layout optimization for RF applications.
• Experience configuring and automating test equipment.
• Large signal RF device characterization.

Oct 15, 2010

[mos-ak] MOS-AK/GSA Seville Workshop Press Release

Press release:
"MOS-AK/GSA Modeling Working Group Holds Workshop in Seville"
can be found on the GSA site at
http://www.gsaglobal.org/news/article.asp?article=2010/1014

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