Determination of well flat band condition in thin film FDSOI transistors using C-V measurement for accurate parameter extraction https://t.co/6djtGE7OZV #paper https://t.co/RYLH3fSGhg

Determination of well flat band condition in thin film FDSOI transistors using C-V measurement for accurate parameter extraction https://t.co/6djtGE7OZV #paper http://pic.twitter.com/RYLH3fSGhg

— Wladek Grabinski (@wladek60) November 21, 2017

from Twitter https://twitter.com/wladek60

November 21, 2017 at 11:54PM
via IFTTT

A 32 kb 9T near-threshold SRAM with enhanced read ability at ultra-low voltage operation https://t.co/R0t2mdhbMF #paper

A 32 kb 9T near-threshold SRAM with enhanced read ability at ultra-low voltage operation https://t.co/R0t2mdhbMF #paper

— Wladek Grabinski (@wladek60) November 21, 2017

from Twitter https://twitter.com/wladek60

November 21, 2017 at 11:18PM
via IFTTT

[mos-ak] [Final Program] 10th International MOS-AK Workshop in the Silicon Valley

10th International MOS-AK Workshop 

(co-located with the CMC Meeting and IEDM Conference) 

http://www.mos-ak.org/silicon_valley_2017/ 

Silicon Valley, December 6, 2017 

Final Program 

Together with local organization teams Cadence Design Systems and Keysight Technologies as well as International MOS-AK Board of R&D Advisers: Larry Nagel, Omega Enterprises Consulting (USA), Andrei Vladimirescu, UCB (USA); ISEP (FR) and all the Extended MOS-AK TPC Committee, we have pleasure to invite to the MOS-AK Compact Modeling Workshop which will be organized for consecutive 10th time in the timeframe of coming IEDM and CMC Meetings.

Scheduled,10th subsequent MOS-AK modeling workshop organized in the Silicon Valley, aims to strengthen a network and discussion forum among experts in the field, enhance open platform for information exchange related to compact/SPICE modeling and Verilog-A standardization, bring people in the compact modeling field together, as well as obtain feedback from technology developers, circuit designers, and TCAD/EDA tool developers and vendors. The MOS-AK workshop program is available online:

<http://www.mos-ak.org/silicon_valley_2017/>

Venue: 

Cadence Design Systems 

2655 Seely Ave

San Jose, CA 95134

Building 5 (map)

Online Workshop Registration is still open

(any related inquiries can be sent to register@mos-ak.org)

Postworkshop Publications:

Selected best MOS-AK technical presentation will be recommended for further publication
in a special issue of the International Journal of High Speed Electronics and Systems

Extended MOS-AK Committee

WG211117

--
You received this message because you are subscribed to the Google Groups "mos-ak" group.
To unsubscribe from this group and stop receiving emails from it, send an email to mos-ak+unsubscribe@googlegroups.com.
To post to this group, send email to mos-ak@googlegroups.com.
Visit this group at https://groups.google.com/group/mos-ak.
For more options, visit https://groups.google.com/d/optout.

Three-dimensional vertical Si nanowire MOS capacitor #model structure for the study of electrical versus... https://t.co/vekyZr5RmC

Three-dimensional vertical Si nanowire MOS capacitor #model structure for the study of electrical versus... https://t.co/vekyZr5RmC

— Wladek Grabinski (@wladek60) November 21, 2017

from Twitter https://twitter.com/wladek60

November 21, 2017 at 04:49PM
via IFTTT

Three-dimensional vertical Si nanowire MOS capacitor #model structure for the study of electrical versus geometrical Si nanowire characteristics https://t.co/OnvqDTh6l2

Three-dimensional vertical Si nanowire MOS capacitor #model structure for the study of electrical versus geometrical Si nanowire characteristics https://t.co/OnvqDTh6l2

— Wladek Grabinski (@wladek60) November 21, 2017

from Twitter https://twitter.com/wladek60

November 21, 2017 at 04:48PM
via IFTTT