Let me draw your attention to the 16th International Conference Mixed
Design of Integrated Circuits and Systems MIXDES'2009 (www.mixdes.org )
which will be held in ?ódz', June 25-27, 2009. During this conference,
as usually, we will meet at a special session on compact modeling. A
general topic of the session will be "Device level support for emerging
CMOS technologies".
Dec 5, 2008
Nov 26, 2008
New papers (November 26, 2008)
A brief selection of papers:
Accurate Intrinsic Gate Capacitance Model for Carbon Nanotube-Array Based FETs Considering Screening Effect, (abstract) in Electron Device Letters, IEEE
Analytical Model of Subthreshold Current and Slope for Asymmetric 4-T and 3-T Double-Gate MOSFETs, (abstract) in Electron Devices, IEEE Transactions on
Three-Dimensional Closed-Form Model for Potential Barrier in Undoped FinFETs Resulting in Analytical Equations forVT and Subthreshold Slope, (abstract) in Electron Devices, IEEE Transactions on
A Non-Charge-Sheet Analytic Model for Symmetric Double-Gate MOSFETs With Smooth Transition Between Partially and Fully Depleted Operation Modes, (abstract) in Electron Devices, IEEE Transactions on
Carrier Mobility in Undoped Triple-Gate FinFET Structures and Limitations of Its Description in Terms of Top and Sidewall Channel Mobilities, (abstract) in Electron Devices, IEEE Transactions on
Enjoy your reading!
Accurate Intrinsic Gate Capacitance Model for Carbon Nanotube-Array Based FETs Considering Screening Effect, (abstract) in Electron Device Letters, IEEE
Analytical Model of Subthreshold Current and Slope for Asymmetric 4-T and 3-T Double-Gate MOSFETs, (abstract) in Electron Devices, IEEE Transactions on
Three-Dimensional Closed-Form Model for Potential Barrier in Undoped FinFETs Resulting in Analytical Equations for
A Non-Charge-Sheet Analytic Model for Symmetric Double-Gate MOSFETs With Smooth Transition Between Partially and Fully Depleted Operation Modes, (abstract) in Electron Devices, IEEE Transactions on
Carrier Mobility in Undoped Triple-Gate FinFET Structures and Limitations of Its Description in Terms of Top and Sidewall Channel Mobilities, (abstract) in Electron Devices, IEEE Transactions on
Enjoy your reading!
Subscribe to:
Comments (Atom)