Aug 19, 2025

[paper] An Open-Source AMS Circuit Optimization

Z. Li and A. Chan Carusone
An Open-Source AMS Circuit Optimization Framework Based on Reinforcement Learning
From Specifications to Layouts
in IEEE Access, vol. 12, pp. 150032-150045 (2024) 
DOI: 10.1109/ACCESS.2024.3478832

Abstract: This paper presents a fully open-sourced AMS integrated circuit optimization framework based on reinforcement learning (RL). Specifically, given a certain circuit topology and target specifications, this framework optimizes the circuit in both schematic and post-layout phases. We propose using the heterogeneous graph neural network as the function approximator for RL. Optimization results suggest that it can achieve higher reward values with fewer iterations than the homogeneous graph neural networks. We demonstrate the applications of transfer learning (TL) in optimizing circuits in a different technology node. Furthermore, we show that by transferring the knowledge of schematic-level optimization, the trained RL agent can optimize the post-layout performance more efficiently than optimizing post-layout performance from scratch. To showcase the workflow of our approach, we extended our prior work to optimize latched comparators in the SKY130 and GF180MCU processes. Simulation results demonstrate that our framework can satisfy various target specifications and generate LVS/DRC clean circuit layouts.


FIG: Proposed AMS IC optimizer overview. 
The picture is adapted from [Z. Li and A. C. Carusone; 2023]

Acknowledgment: The authors would like to thank Dr. Hossein Shakiba from Huawei Technologies
for his valuable discussions throughout this project.

[REF] Z. Li and A. C. Carusone, "Design and optimization of low-dropout voltage regulator using relational graph neural network and reinforcement learning in open-source SKY130 process," in Proc. IEEE/ACM Int. Conf. Comput. Aided Design (ICCAD), Oct. 2023, pp. 1–9.


Aug 15, 2025

[mos-ak] Join the ICMC 2026 Organizing Team

International Compact Modeling Conference (ICMC) 2025 was a great success - thank you to everyone who contributed!  We're excited to announce that preparations are already underway for the next edition, taking place July 30–31, 2026 in Long Beach, California.

We are currently seeking enthusiastic volunteers to join the ICMC2026 organizing committees. If you're interested in helping shape next year's event, please complete the survey linked below:
https://survey.zohopublic.com/zs/bQfsUq

Submission deadline: August 25, 2025

📩 For questions about available roles, feel free to contact:

Shahed Reza, ICMC2026 General Chair or

Gert-Jan Smit, ICMC2026 Technical Program Chair

We look forward to your participation!

Thank you,
Leigh Anne Clevenger , Si2, on behalf of the ICMC2026 Organizing Committee

Aug 11, 2025

[mos-ak] [Final Program] 9th Sino MOS-AK Workshop Shenzhen

Arbeitskreis Modellierung von Systemen und Parameterextraktion
Modeling of Systems and Parameter Extraction Working Group
9th Sino MOS-AK Workshop Shenzhen
August 14-16, 2025

We are pleased to invite you to participate in the 9th Sino MOS-AK Workshop, a premier forum for researchers, engineers, and industry professionals engaged in the device simulations, compact modeling, Verilog-A standardization, and advanced circuit design. This year's workshop will be hosted at SUSTech in Shenzhen, offering a dynamic program that blends cutting-edge research with practical insights. 

Venue:
  • Southern University of Science and Technology (SUSTech), Shenzhen, China
  • Aug.14 Room 103
  • Aug.15 Room 103
  • Aug.15 Room 104
  • Aug.16 Room 103
  • Aug.16 Graduate Student Poster Session
We look forward to your participation in this vibrant exchange of ideas and innovations. For registration and inquiries, please contact: music@sustech.edu.cn

-- Min Zhang and W.Grabinski on the behalf of International MOS-AK TPC Committee

Enabling Compact Modeling R&D Exchange

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Aug 7, 2025

[book] Guide to Characteristics and Characterization of Semiconductor Surfaces





Guide to Characteristics and Characterization 
of Semiconductor Surfaces
By: Jerzy Ruzyllo (Penn State University, USA)
https://doi.org/10.1142/12792 | May 2025 | Pages: 220





This comprehensive compendium explores aspects of semiconductor surface characteristics and characterization from the perspective of applied semiconductor device research and process development, rather than an in-depth coverage of surface science related issues. It provides guidance to the features of semiconductor surfaces affecting performance of the practical semiconductor devices, as well as selection of methods used to characterize those features.

Based on the author's over thirty years of research and graduate advising in semiconductor surface processing and characterization, this unique reference text addresses the needs of graduate students, researchers and industry professionals who are familiar with semiconductor engineering and would like to learn about the practical aspects of semiconductor surface characteristics, processing techniques, and characterization methods used in device process development, process diagnostics and monitoring.
  • FRONT MATTER i–xv
  • Chapter 1: Surface as a Part of Semiconductor Device Material System 1–14
  • Chapter 2: Effect of Surface on Characteristics of Semiconductor Materials 15–36
  • Chapter 3: Interactions of Semiconductor Surfaces 37–56
  • Chapter 4: Characteristics of Semiconductor Surface Defining its Condition 57–68
  • Chapter 5: Surface Effects in Semiconductor Devices 69–79
  • Chapter 6: Surface Processing in Semiconductor Device Technology 81–117
  • Chapter 7: Semiconductor Surface Characterization Methods 119–152
  • Chapter 8: Characterization of Semiconductor Surfaces in Process Monitoring 153–176
  • BACK MATTER 177–201

Aug 6, 2025

[mos-ak] IEEE SSCS-EDS South Brazil Chapter DL - IHP OpenPDK Initiative – Technology · Devices · Applications

The IEEE SSCS-EDS South Brazil Chapter, chaired by Juan Pablo Martinez Brito, PhD, to host Wladek Grabinski, PhD, a global expert in SPICE modeling and open-source IC design, for a Distinguished Lecture:

IHP OpenPDK Initiative – Technology · Devices · Applications
Date: August 13th, 2025
Time: 14h00 (GMT-3, Brasília)
IEEE SSCS-EDS South Brazil Chapter YouTube Channel

Dr. Grabinski will explore the growing role of FOSS CAD/EDA tools and OpenPDKs in strengthening the semiconductor ecosystem and enabling accessible IC design worldwide.

Thanks to the support of Unisinos, Federal University of Rio Grande do Sul, and UNIPAMPA Universidade Federal do Pampa RS, and to all the volunteers and engineers helping grow our regional chapter. Also, thank you to the chapter Board: Sandro Binsfeld Ferreira, Tiago Oliveira Weber, and Paulo César C. de Aguirre, and Professors Gilson Wirth and Sergio Bampi for the advice.

Looking forward to engaging with students, researchers, and professionals from across Brazil and beyond.


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South Brazil Section Jt. Chapter,SSC37/ED15

#OpenPDK #SPICE #CompactModeling #Semiconductors #IEEE #ICDesign #FOSS #AnalogDesign #PDK #CMOS #IHP #SkyWater #GF #EDA #SouthAmericaSemiconductors #MOSAK #EDS #SSCS #UFRGS #Unisinos #Unipampa

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