IBM, Chartered Semiconductor Manufacturing Ltd., GLOBALFOUNDRIES, Infineon Technologies, Samsung Electronics, Co., Ltd., and STMicroelectronics have defined and are jointly developing a 28nm, high-k metal gate (HKMG), low-power bulk CMOS process technology.
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Apr 18, 2009
Apr 17, 2009
Process for the Selection of the Next Generation Multigate Compact Models
The Compact Modeling Council (CMC) will start the process for the selection of a Multi-Gate MOSFET Compact Model with four-part standardization plan:
- Model pre-evaluation (reference data, test circuits, etc)
- Physical model accuracy evaluation
- Model functionality in IC simulation
- Formal CMC balloting
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