Paper on Science

There is a paper on this month issue of Science from some people of IBM, stating that they have "seen" the dopant distribution in a nano-scale device. The point is, leaving apart the technique, that the dopant does not get an uniform distribution, even after annealing. See the paper: Imaging of Arsenic Cottrell Atmospheres Around Silicon Defects by Three-Dimensional Atom Probe Tomography, by Keith Thompson, Philip L. Flaitz, Paul Ronsheim, David J. Larson, and Thomas F. Kelly

IEEE Trans. on Electron Devices

This month's issue is a "Special Issue on Simulation and Modeling of Nanoelectronics Devices". That means that I will not look for papers, but I'll only say that all of them are quite interesting. There are papers on threshold voltage modeling, on modeling of statistical variations, on quantum effects,... So, have a look!