[paper] Atomic-scale defects in Si/SiO2 transistors

Stephen J. Moxim1, Fedor V. Sharov1, David R. Hughart2, Gaddi S. Haase2, Colin G. McKay2, and Patrick M. Lenahan1

Atomic-scale defects generated in the early/intermediate stages of dielectric breakdown in Si/SiO2 transistors

Appl. Phys. Lett. 120, 063502 (2022);

DOI:10.1063/5.0077946

   

1 The Pennsylvania State University, USA
2 Sandia National Laboratories, New Mexico, USA

Abstract: Electrically detected magnetic resonance and near-zero-field magnetoresistance measurements were used to study atomic-scale traps generated during high-field gate stressing in Si/SiO2 MOSFETs. The defects observed are almost certainly important to time-dependent dielectric breakdown. The measurements were made with spin-dependent recombination current involving defects at and near the Si/SiO2 boundary. The interface traps observed are Pb0 and Pb1 centers, which are silicon dangling bond defects. The ratio of Pb0/Pb1 is dependent on the gate stressing polarity. Electrically detected magnetic resonance measurements also reveal generation of E′ oxide defects near the Si/SiO2 interface. Near-zero-field magnetoresistance measurements made throughout stressing reveal that the local hyperfine environment of the interface traps changes with stressing time; these changes are almost certainly due to the redistribution of hydrogen near the interface.

FIG: Atomic-scale picture of defect formation and hydrogen motion during the early and intermediate stages of SiO2 degradation and breakdown.

Acknowledgements: This work was supported by the Defense Threat Reduction Agency (DTRA) under Award No. HDTRA1-18-0012. The content of the information does not necessarily reflect the position or the policy of the federal government and no official endorsement should be inferred