Dec 11, 2025

[mos-ak] [Final Program] MOS-AK LatAm Webinar, Dec. 12, 2025

Arbeitskreis Modellierung von Systemen und Parameterextraktion
Modeling of Systems and Parameter Extraction Working Group
MOS-AK LatAm Workshop
(online), Dec. 12, 2025

The End‑of‑Year MOS-AK Workshop/Webinar on Compact/SPICE Modeling will be held online on Dec. 12, 2025. We invite you to join this webinar to learn from the experts in Compact SPICE modeling, Verilog‑A standardization, and FOSS CAD/EDA IC design support for OpenPDKs, internationally, with particular focus on Latin America

Venue: MOS-AK LatAm (Webinar)
Online Webinar Access Link: https://meet.jit.si/MOS-AK_LA_2025
  • Final Workshop Program: Dec. 12 2025
  • San Francisco, 09:00 - 11:00
    Rio de Janeiro, 14:00 - 16:00
    Geneve, 18:00 - 20:00
T_1 OpenPDK LatAm
Krzysztof Herman
IHP (D)
T_2 AI/ML-Driven Device Modeling for Advanced Nodes, RF and Power Applications
Fahad Usmani
Keysight Technologies (US)
T_3 Design and Integration of Multiple Open-Source Analog Circuits Fabricated in SKY130 Technology within Silicluster v2
Uriel Jaramillo Toral* Hector Emmanuel MuΓ±oz Zapata and Susana Cisneros Ortega
CINVESTAV (MX)
T_4 SemiCoLab, A Multi-Project ASIC Platform for Democratizing Chip Design
Emilio Baungarten, Susana Ortega, Miguel Rivera, and Francisco Javier
CINVESTAV (MX)
T_5 Building an Ecosystem Through IC Education in Colombia: A Model for Emerging Semiconductor Regions
Juan SebastiΓ‘n Moya Baquero
SymbioticEDA
T_6 Silicon-Proven Learning With OpenPDKs and MPW Access for IC Education
Eduardo Holguin Weber
Universidad San Francisco de Quito (EC)
T_7 OpenPDK Mismatch Testchip
Juan Pablo Martinez Brito
CEITEC S.A. (BR)
T_8 Physics-Based Modeling and Charge Density Saturation in GaN/AlGaN MOS-HEMTs
Ashkhen Yesayan, Farzan Jazaeri, Jean-Michel Sallese
EPFL (CH)

W.Grabinski for Extended MOS-AK Committee
WG111225

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Dec 10, 2025

[paper] Noise Propagation and Statistic Variability in MOSFETs

Raphael Chatzipantelis, Loukas Chevas, Nikolaos Makris and Matthias Bucher
Noise Propagation and Statistic Variability in MOSFETs Using Probability Density Functions
Fluctuation and Noise Letters (Accepted Paper)
DOI: 10.1142/S0219477525400255

1) School of Electrical and Computer Engineering, Technical University of Crete, Chania 73100, Greece
2) Foundation for Research and Technology Hellas, Heraklion 70013, Greece,


Abstract: Probability density functions using stochastic methods are shown to be an effective tool in the context of MOSFET noise and variability modeling. These methods are employed here in the context of the charge-based EKV MOSFET model. As an example, a Gaussian noise density function applied at the gate or the source of a MOSFET causes a corresponding drain current noise density function, which may be expressed analytically as a function of inversion coefficient only. The same expression may be used to model drain current variability due to MOSFET parameters such as threshold voltage. Furthermore, the method is extended to variations of quantities such as transconductance and transconductance-to-current ratio. The method shows promise in variability modeling of MOSFETs and may complement traditional approaches.
FIG: Comparing the traditional ”small-signal” transconductance method with the stochastic PDF method for 𝑖𝑓, derived from the charge-based model, where in both cases the same noise (or variability) at the gate is applied (𝑉𝐺= 87mV, πœŽπ‘‰πΊ=10mV), centered at 𝑖𝑓=2, showing slightly different mean and ±3𝜎 values, while the tail distributions differ significantly.

Acknowledgements: The authors gratefully acknowledge Dr. Predrag Habas from EM Microelectronic S.A. for valuable discussions and wafers for noise and statistical analysis. This work was partly funded by the European Union, and by Greek National funds, under the topic DIGITAL- Chips-2024-SG-CCC-1 - Competence Centers, Project No 101217803 - HCCC.