2 Departament d’Enginyeria Electrònica, Elèctrica i Automàtica, URV, Tarragona 43007, Spain
Apr 30, 2021
[paper] Dynamic Simulation of a-IGZO TFT Circuits Using AFCM
2 Departament d’Enginyeria Electrònica, Elèctrica i Automàtica, URV, Tarragona 43007, Spain
[paper] Does the Threshold Voltage Extraction Method Affect Device Variability?
* CITIUS, Universidade de Santiago de Compostela, Galicia, Spain
Abstract: The gate-all-around nanowire FET (GAA NW FET) is one of the most promising architectures for the next generation of transistors as it provides better performance than current mass-produced FinFETs, but it has been proven to be strongly affected by variability. For this reason, it is essential to be able to characterize device performance which is done by extracting the figures of merit (FoM) using data from the IV curve. In this work, we use numerical simulations to evaluate the effect of the threshold voltage ( VTH ) extraction method on the variability estimation for a gate-all-around nanowire FET. For that, we analyse the impact of four sources of variability: gate edge roughness (GER), line edge roughness (LER), metal grain granularity (MGG) and random discrete dopants (RDD). We have considered five different extraction methods: the second derivative (SD), constant current (CC), linear extrapolation (LE), third derivative (TD) and transconductance-to-current-ratio (TCR). For the ideal non-deformed device at high drain bias, the effect of the extraction technique can lead to a 137 mV difference in VTH and an 89 mV/V difference in the drain-induced-barrier-lowering (DIBL), and when considering GER and LER variability, the influence of the extraction method leads to differences in the standard deviation values of the VTH distribution ( σVTH ) of up to 2.3 and 3.7 mV respectively, values comparable to intrinsic parameter variations. Therefore, the VTH extraction technique presents itself as an additional parameter that should be included in performance comparisons as it can heavily impact the results.
Apr 29, 2021
[PhD] VLSI Interconnect Reliability
Apr 28, 2021
Nanya Technology, the world’s fourth-largest #memory chip manufacturer
Nanya Technology, the world’s fourth-largest #memory chip manufacturer, announced plans to establish a $10.7 billion #factory in #Taiwan [The Burn-In https://t.co/GBY81ni575] #semi pic.twitter.com/QHP2NukgZC
— Wladek Grabinski (@wladek60) April 28, 2021
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April 28, 2021 at 09:44AM
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Apr 26, 2021
A #future view of the #Semiconductor Industry
A #future view of the #Semiconductor Industry https://t.co/Rue5BNO3g3 #semi pic.twitter.com/GezAfJRd1d
— Wladek Grabinski (@wladek60) April 26, 2021
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April 26, 2021 at 10:34AM
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Apr 21, 2021
[paper] Physical parameter-based data-driven modeling
1 Department of Electric and Electronic Engineering, Mus¸ Alparslan University, Mus, Turkey
2 Department of Electronics and Communication Engineering, Yıldız Technical University, Istanbul, Turkey
3 Department of Electronic and Automation, Vocational School of Technical Sciences, Istanbul University Cerrahpasa, Istanbul, Turkey
#Flying on #Mars fueled with #opensource software
#Flying on #Mars fueled with #opensource software | ZDNet https://t.co/t8K6REnpdO #semi pic.twitter.com/2ttgq3v9A4
— Wladek Grabinski (@wladek60) April 20, 2021
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Apr 20, 2021
[papers] Compact Modeling
[1] Nicolo Zagni; Simulation and Modeling Methods for Predicting Performance and Reliability Limits of 21st-Century Electronics; PhD Thesis, Universita Degli Estudi Di Modena e Reggio Emilia; Anno Accademico 2019–2020 (CICLO XXXIII)
Abstract: In recent years, a plethora of novel semiconductor devices have started emerging as worthy heirs of Silicon-based transistors – giving rise to the ’post-Moore’ era. Traditional electronics is mostly based on Si devices, – from logic to memory, to high frequency/power and sensing applications – but this paradigm is changing thanks to the developments in different fields ranging from physics and semiconductor materials, to processing techniques and computing architectures. In this hectic new scenario, before even considering a new technology as a replacement of the existing ones, the limiting factors to its performance and reliability need to be well-understood and engineered for. In this sense, simulations and physics-based modeling represent critical tools to make sure that newly conceived technologies stand up to the requirements of 21st century electronics. In this thesis, state-of-the-art simulation and compact modeling tools are exploited to analyze the performance and reliability limits of several emerging technologies. Specifically, this dissertation is focused on four application scenarios and the relative candidate technologies that aim to providing enhanced performance/reliability compared to Si-based counterparts. These are: i) III-V MOSFETs for logic/digital circuits, ii) resistive-RAMs and ferroelectric-FETs for non-volatile memory and in-memory computing, iii) GaN-based high-speed transistors for power applications, and iv) negative capacitance transistors for biosensing.
[2] G. Maroli, A. Fontana, S. M. Pazos, F. Palumbo and P. Julián, "A Geometric Modeling Approach for Flexible, Printed Square Planar Inductors under Stretch," 2021 Argentine Conference on Electronics (CAE), Bahia Blanca, Argentina, 2021, pp. 61-66, DOI: 10.1109/CAE51562.2021.9397568.
Abstract: In this work a compact model for square planar inductors printed on flexible substrate is proposed. The approach considers the deformation of the metal traces of square spiral inductors when the substrate is subjected to physical stretch. The model considers a typical pi-network for the device, where each component is calculated for different stretching values adapting widely accepted models on the literature for the total inductance, the AC resistance and the ground coupling and inter-wounding capacitances. Model results are contrasted to 3D full electromagnetic wave simulations under parametric sweeps of the dimensions calculated under stretch. Results show good agreement within a 20 % stretch up to the first resonance frequency of the structure. The model can prove useful for the optimization of component design for printed applications on flexible substrates.
[3] H. Kikuchihara et al., "Modeling of SJ-MOSFET for High-Voltage Applications with Inclusion of Carrier Dynamics during Switching," 2021 International Symposium on Devices, Circuits and Systems (ISDCS), Higashihiroshima, Japan, 2021, pp. 1-4, DOI: 10.1109/ISDCS52006.2021.9397904.
Abstract: Demands for higher-voltage MOSFET application are increasing, for which a Super-Junction MOSFET, sustaining the voltages in the range of 500V, has been developed based on the trench-type structure. Due to the huge bias applied, a new leakage-current type is induced during switching, which causes a switching-power-loss increase. Creating a compact model for circuit design, which includes this additional leakage current, is the purpose of the present development. The model describes the depletion-width variation, caused during the switching-on of the device, with the use of the internal node potential, determined accurately by iteration. It is verified, that the new compact model can accurately predict the device performances for different device structures. This capability can be used for device optimization to realize low-power circuitry.
Foundry Wars Begin
Foundry Wars Begin [Mark LaPedus https://t.co/w4Z02tvMPq] #semi pic.twitter.com/x0NKvekgI0
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April 19, 2021 at 11:59PM
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Apr 19, 2021
[paper] Deep-Learning Assisted Compact Modeling
[Photos] MOS-AK LADEC Mexico April 18, 2021
Group Photo
[ECE Seminar] #GLOBALFOUNDRIES #22nm# FDSOI: Enabling Long Battery Life and Unmatched RF Integration in IOT Systems-on-Chip https://t.co/50X0K1cML2 #semi https://t.co/aCgqVU4SF4
[ECE Seminar] #GLOBALFOUNDRIES #22nm# FDSOI: Enabling Long Battery Life and Unmatched RF Integration in IOT Systems-on-Chip https://t.co/50X0K1cML2 #semi pic.twitter.com/aCgqVU4SF4
— Wladek Grabinski (@wladek60) April 19, 2021
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April 19, 2021 at 10:17AM
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Apr 16, 2021
More #wafer #fabs in the #US – When, how? #Intel’s Ocotillo facility in Arizona will be the site where the company will build two new fabs to increase #semi manufacturing capacity in the U.S. [Intel / Electronics360 https://t.co/sBVxQfKqjR] https://t.co/RMYWXx4ZAD
More #wafer #fabs in the #US – When, how? #Intel’s Ocotillo facility in Arizona will be the site where the company will build two new fabs to increase #semi manufacturing capacity in the U.S. [Intel / Electronics360 https://t.co/sBVxQfKqjR] pic.twitter.com/RMYWXx4ZAD
— Wladek Grabinski (@wladek60) April 16, 2021
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April 16, 2021 at 08:33PM
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Think tank - Stiftung Neue Verantwortung (SNV) : rejuvenate #European #IC design before building a #fab [Bits&Chips https://t.co/9jc6XZ9kJV] #semi https://t.co/3Lj94gk8zn
Think tank - Stiftung Neue Verantwortung (SNV) : rejuvenate #European #IC design before building a #fab [Bits&Chips https://t.co/9jc6XZ9kJV] #semi pic.twitter.com/3Lj94gk8zn
— Wladek Grabinski (@wladek60) April 16, 2021
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April 16, 2021 at 11:23AM
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SEL-Silvaco unite to develop #SPICE #CAAC-#IGZO model of oxide semiconductor #FET https://t.co/PjLR4Wm5jX #semi https://t.co/SQJBlzllOi
SEL-Silvaco unite to develop #SPICE #CAAC-#IGZO model of oxide semiconductor #FET https://t.co/PjLR4Wm5jX #semi pic.twitter.com/SQJBlzllOi
— Wladek Grabinski (@wladek60) April 16, 2021
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April 16, 2021 at 10:19AM
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Apr 15, 2021
[paper] GaN-HEMT Compact Model
1 Centre for Advanced Low-Carbon Propulsion Systems, Coventry University, Coventry CV1 2TL, UK
2 Power Electronics, Machines and Control Group, University of Nottingham, Nottingham NG7 2RD, UK;
3 Laboratoire d’Electrotechnique et d’Electronique de Puissance, Université de Lille, France;
#RaspberryPi4 owners can now train their own custom models using Edge Impulse's cloud-based development platform for #machine #learning on edge devices https://t.co/Ge30t4tdmN #semi https://t.co/baPQdajRrk
#RaspberryPi4 owners can now train their own custom models using Edge Impulse's cloud-based development platform for #machine #learning on edge devices https://t.co/Ge30t4tdmN #semi pic.twitter.com/baPQdajRrk
— Wladek Grabinski (@wladek60) April 15, 2021
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April 15, 2021 at 10:39AM
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Apr 13, 2021
[mos-ak] [Final Program] 3rd MOS-AK LAEDC Workshop (virtual/online) April 18, 2021
https://www.mos-ak.org/mexico_2021/
- Session 1 (APR.18) begins: 8:00am Mexico time zone (GMT-5)
- Session 2 (APR.18) begins: 1:00pm Mexico time zone (GMT-5)
https://forms.gle/PQgZk9td3Jeb4MWZ9
Postworkshop Publications: Selected best MOS-AK technical presentation will be recommended for further publication in a special Solid State Electronics (SSE) issue on compact modeling.
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[paper] Performance limits of hBN as an insulator for scaled CMOS
1. Institute for Microelectronics, TU Wien, Vienna, Austria.
2. Ioffe Institute, St Petersburg, Russia.
3. Integrated Systems Laboratory, ETH Zürich, Zurich, Switzerland.
4. Christian Doppler Laboratory for Single-Defect Spectroscopy in Semiconductor Devices at the Institute for Microelectronics, TU Wien, Vienna, Austria.
5. Institute for Photonics, TU Wien, Vienna, Austria.
6. Research Center for Functional Materials, National Institute for Matierals Science, Tsukuba, Japan.
7. International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba, Japan.
8. Physical Sciences and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, Saudi Arabia.
[papers] Compact Modeling
Apr 12, 2021
White House to zero in on #chip shortage in meeting with company officials
White House to zero in on #chip shortage in meeting with company officials https://t.co/nWHQdUdA58 #semi pic.twitter.com/nK4jk8QdAR
— Wladek Grabinski (@wladek60) April 12, 2021
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April 12, 2021 at 05:22PM
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[Neal Freyman] Chips Wanted
[Neal Freyman] Chips Wanted: we’ve faced a number of shortages over the past year - toilet paper, GrapeNuts, joy. But one shortage continues to stand above the rest in its ability to damage the global economy: #semiconductors. https://t.co/QheyzfdCBo #semi pic.twitter.com/S2f9ypt4k2
— Wladek Grabinski (@wladek60) April 12, 2021
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April 12, 2021 at 01:58PM
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The lack of #semi manufacturing in #Europe
The lack of #semi manufacturing in #Europe - This white paper examines the #EU's declared goal of enabling a #waferfab to be operating in Europe with #2nm process capability by the end of the decade https://t.co/bad7YvZzkq pic.twitter.com/Y35YYachr0
— Wladek Grabinski (@wladek60) April 12, 2021
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April 12, 2021 at 12:05PM
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[euresearch.ch] Are you ready for the ERC?
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[C4P] IEEE NMDC 2021 - abstracts due 15-April
16th IEEE Nanotechnology Materials and Devices Conference
October 17th to 20th, 2021 | Vancouver, BC, Canada
Website: https://ieeenmdc.org/nmdc-2021
CALL for PAPERS (download PDF)
Short Abstract (text only) Submission Deadline: April 15, 2021
The IEEE Nanotechnology Council is pleased announce the First Call for Papers for the 16th IEEE Nanotechnology Materials and Devices Conference (IEEE NMDC 2021) which will be co-located with the IEEE Conference on Electrical Insulation and Dielectric Phenomena (IEEE CEIDP) sponsored by the IEEE Dielectrics and Electrical Insulation Society (DEIS).
Recognizing that plans for this in-person conference could be affected by circumstances related to COVID-19, updates will be provided at IEEE NMDC 2021.
Special Session and Workshop/Tutorial Proposals Deadline: March 31, 2021
Short Abstract (text only) Submission Deadline: April 15, 2021
Regular, Special Session and Invited Papers Submission Deadline: May 31, 2021
Late Breaking News Extended Abstract Submission Deadline: August 10, 2021
See the Call for Papers page here.
Information for Authors including Submission Instructions and requirements can be found on these pages.
Message sent to IEEE Nanotechnology Council interest list.
Copyright © 2021 IEEE Nanotechnology Council
Apr 9, 2021
RT: 16bit CPU for the HP 9825 computer
HP 5061-3001 (1975) While Intel marketed the i4004, HP developed a full blown 16bit CPU for the HP 9825 computer. It was implemented with 4 NMOS dies on a ceramic module, the BPC (Binary Processor Chip), EMC (Extended Math Chip), IOC (I/O chip) and AEC (Extended Address Chip). pic.twitter.com/jqyoElbQKm
— Siliconinsider (@Siliconinsid) April 7, 2021
Apr 7, 2021
#Cycling is ten times more important than electric cars for reaching #net-zero cities https://t.co/0Rxbm2Ygt1 #semi https://t.co/lrtHaI1u4N
#Cycling is ten times more important than electric cars for reaching #net-zero cities https://t.co/0Rxbm2Ygt1 #semi pic.twitter.com/lrtHaI1u4N
— Wladek Grabinski (@wladek60) April 7, 2021
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April 07, 2021 at 09:28PM
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[papers] compact modeling
#Intel to try to become a #foundry, AGAIN?
https://t.co/6AwDz1O1tV #semi pic.twitter.com/WrIDhjEKy3
— Wladek Grabinski (@wladek60) April 7, 2021
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April 07, 2021 at 02:02PM
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[paper] Compact Modeling as a Bridge between Technologies and ICs
Apr 6, 2021
What China is to #India, #USA is to #China
What China is to #India, #USA is to #China https://t.co/ikl6EdqMSn #semi pic.twitter.com/SfZvmwEGh5
— Wladek Grabinski (@wladek60) April 6, 2021
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April 06, 2021 at 03:28PM
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[C4P] DevIC 2021
DevIC 2021: Call for Papers
- CMOS Processes, Devices and Integration;
- VLSI Technology and Circuits;
- Innovative Systems;
- Emerging Non-CMOS Devices & Technologies;
- Device Modelling & Simulation;
- Device Characterization, Reliability & Yield;
- Devices with New material systems;
- Devices for Low power applications;
- Low dimensional devices;
- Low dimensional Semiconductors;
- Design and Simulation of Circuits with nanoscale devices;
- MEMS, Sensors & Display Technologies;
- Advanced & Emerging Memories;
- High frequency wireless communication;