Showing posts with label nano. Show all posts
Showing posts with label nano. Show all posts

Jan 19, 2023

IEEE EDS MQ at NIT Silchar Silchar, Assam (IN)

IEEE EDS Mini-Colloquium 
on Micro/Nanoelectronics, Devices, Circuits and Systems, 
29-31 Jan 2023 (Hybrid Mode)

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Date: 29 Jan 2023
Time:10:00AM to 06:00PM
 (UTC+05:30) 
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National Institute of Technology Silchar
Dept of ECE,
NIT Silchar Silchar, Assam India 788010
Building: ECE/CSE Building


National Inst of Technology - Silchar,
ED15 Kolkata Section Chapter NANO42
Co-sponsored by Dr. Trupti R. Lenka


Starts
Dec.1, 2022
Ends
Jan.28,2023

No Admission Charge
Register NOW

Agenda with following contribution Distinguished Lecturers: 
  • Anil Kottantharayil (anilkg@ieee.org)
  • Gananath Dash (gndash@ieee.org)
  • Ajit Kumar Panda (akpanda62@hotmail.com)
  • Manoj Saxena (msaxena@ieee.org)
  • Brajesh Kumar Kaushik (bkkaushik23@gmail.com)
  • Samar Saha (samar@ieee.org)
  • Hiroshi Iwai (h.iwai@ieee.org)
  • Taiichi Otsuji (taiichi.otsuji.e8@tohoku.ac.jp)
  • Pei-Wen Li (pwli@nycu.edu.tw)
  • Zhou Xing (EXZHOU@ntu.edu.sg)
  • Albert Chin (albert_achin@hotmail.com)
  • Mansun Chan (mchan@ust.hk)
  • Chao-Sung LAI (cslai@mail.cgu.edu.tw)
  • Wladek Grabinski, MOS-AK, EU (wladek@grabinski.ch)

Feb 9, 2022

[book] Nano Interconnects: Device Physics, Modeling and Simulation

Afreen Khursheed and Kavita Khare
Nano Interconnects: Device Physics, Modeling and Simulation
CRC Press; 1st edition (2021)
ISBN: ‎ 978-0367610487

This textbook comprehensively covers on-chip interconnect dimension and application of carbon nanomaterials for modeling VLSI interconnect and buffer circuits. It provides analysis of ultra-low power high speed nano-interconnects based on different facets such as material modeling, circuit modeling and the adoption of repeater insertion strategies and measurement techniques. It covers important topics including on-chip interconnects, interconnect modeling, electrical impedance modeling of on-chip interconnects, modeling of repeater buffer and variability analysis. Pedagogical features including solved problems and unsolved exercises are interspersed throughout the text for better understanding. Aimed at senior undergraduate and graduate students in the field of electrical engineering, electronics and communications engineering for courses on Advanced VLSI Interconnects, Advanced VLSI Design, VLSI Interconnects, VLSI Design Automation and Techniques, this book:

  • Provides comprehensive coverage of fundamental concepts related to nanotube transistors and interconnects.
  • Discusses properties and performance of practical nanotube devices and related applications.
  • Covers physical and electrical phenomena of carbon nanotubes, as well as applications enabled by this nanotechnology.
  • Discusses the structure, properties, and characteristics of graphene-based on-chip interconnect.
  • Examines interconnect power and interconnect delay issues arising due to downscaling of device size.

Mar 5, 2021

[C4P] IEEE-NANO 2021 (Virtual) Montreal, Canada

IEEE-NANO 2021
Nanotechnology Flagship Conference
July 28-30, 2021 | Virtual from Montreal, Canada
Abstract Submission Deadline Extended: March 15, 2021 

CALL for PAPERS (download PDF)
Nanotechnology researchers will gather to exchange information across disciplines at the 21st IEEE International Conference in Nanotechnology, the flagship conference of the IEEE Nanotechnology Council. We hope you will join us at IEEE-NANO 2021, to be held virtually July 28th–30th, 2021 from Montreal. The IEEE-NANO 2021 is now calling for abstract submission. View Technical Interests Here and access the Submission System Here

We are delighted to share with you our confirmed distinguished plenary speakers:
  • John Polanyi, Nobel Laureate (University of Toronto)
  • Yury Gogotsi (Drexel University)
  • Luisa De Cola (University of Strasbourg)
  • Shelley Minteer (University of Utah)
Following the tradition of the NANO conferences, participants have the opportunity to publish their research in IEEE Xplore® and IEEE Transactions in Nanotechnology.
Important Dates:

Abstract Submission: March 15, 2021
Notice of acceptance: March 31, 2021
Submission of full paper for proceedings: May 1, 2021
Short notice proceedings for exceptional findings: June 1, 2021
Notification of short notice proceedings acceptance-revision-rejection: June 15, 2021

Jun 12, 2015

Micro&Nano 2015 - 2nd Announcement

6th Micro & Nano Conference on Micro - Nanoelectronics, Nanotechnologies and MEMs
4-7 October, 2015, Athens, Greece

http://conference-micronano2015.micro-nano.gr
Second Announcement

The "Micro&Nano 2015" Conference will be held at the Fenix Hotel, in Glyfada, Athens, Greece. The Best Western Hotel Fenix is conveniently located in Glyfada, an attractive resort in the south coast of Athens. More details on the Conference venue can be found on the conference website:
<http://conference-micronano2015.micro-nano.gr>

Conference Topics:
  • Micro and Nano- Fabrication
  • Materials for Electronics, Photonics and Sensors
  • Electronic, Optoelectronic and Photonic Devices
  • Sensors and Actuators
All abstracts should not exceed the limit of 300 words. Please follow the abstract template that can be found here. The deadline for abstract submission is on 30 June 2015.

The Conference abstracts will be published in the "Abstract Book" that will be distributed to all the participants, at the beginning of the Conference. Selected papers will be published, after peer-review, in special issues of the following international journals:
  • Nanoscale Research Letters (the nanoscience related articles)
  • Microelectronic Engineering
[read more: http://conference-micronano2015.micro-nano.gr]

Apr 3, 2014

VI Regional Seminar MNE & MS 2014

VI Regional Seminar on Computer Modeling and Designing in Micro- and Nanoelectronics and in Microelectromechanical Systems (MNE & MS 2014),
Orel, Russia, March 28 2014
  1. С.И. Матюхин1, Welcome and Seminar Openning,
    1Госуниверситет-УНПК
  2. Турин В.О.1, Кильчицкая М.В.2, Герасимов К.А.2Simulation of power bipolar transistor,
    1Госуниверситет-УНПК, 2БГТУ, г. Брянск
  3. Ващенко В.А., The physical ESD design for integrated circuits and electronic devices,
    Maxim Integrated Corp., г. Сан Хосе, Калифорния, США
  4. Цырлов А.М., Development of CMOS optocoupler,
    ОАО «Протон», г. Орёл
  5. Студенников А.С., Development of CMOS ICs,
    ОАО «Протон», г. Орёл
  6. Малый Д.О.1, Матюхин С.И.2, Ставцев А.В.1"Proton-Elektroteks" IGBT-devices JSC: basic approaches of production and quality assurance,
    1ЗАО «Протон-Электротекс», г. Орёл, 2Госуниверситет-УНПК
  7. Макулевский Г.Р., Матюхин С.И., Current-voltage characteristics of laser diodes based on AlGaAs,
    Госуниверситет-УНПК
  8. Матюхин С.И., Гришин В.О., Radiation effects of on the current-voltage characteristic of power diodes and thyristors,
    Госуниверситет-УНПК
  9. Писарев А.А.1, Матюхин С.И.2, Сурма А.М.1, Черников А.А.1Electrical characteristics of fast diodes with soft recovery,
    1ЗАО «Протон-Электротекс», г. Орёл, 2Госуниверситет-УНПК
  10. Koziol Z., Aestimo quantum mechanical software for modeling quantum wells in nanoelectronics,
    TU Rzeszow, Polska

Jun 11, 2013

EU Goal: Reach 20% World-Share in Chip Manufacturing by 2020

EU to spend € 10 billion to trigger € 100 billion investments — SEMI provides the platforms for our members to share critical implementation issues and actions to support the goals set by the EU [H. Kundert, president, SEMI Europe] 

The new European industrial strategy for micro- and nano-electronics, published on 23 May 2013, sets the framework for targeted investment across the electronics value and innovation chain. An Industrial Strategy Roadmap for Investment, to be developed by end 2013, will cover three complementary lines:
  • Transition to 450mm, expected to primarily benefit equipment and material manufacturers in Europe
  • “More than Moore” on 200mm and 300 mm
  • “More Moore” for ultimate miniaturization on 300mm wafers
Investment will be concentrated, focusing on Europe’s clusters of excellence in manufacturing and design (Grenoble, Dresden and Eindhoven-Leuven), but will also support partnerships and alliances across the value chain in Europe.

[read more...] also don't miss the SEMICON Europa 2013 Call for Papers (open until June 27). The conferences are a great opportunity to present your technology and latest achievements to a large audience of industry professionals. For more information about SEMICON Europe programs, the Call for Papers and opportunities to exhibit and present your products please go online and visit semiconeuropa.org.

Mar 18, 2013

NANO 2013

Symposium on Nanostructured Materials to be held May 21-22, 2013 at the University of Rzeszow, Poland. The Symposium will be a major event during the grand opening of the Center for Microelectronics and Nanotechnology. This conference is devoted to the current trends in research on layer-structured materials and one-dimensional nanomaterials. Emphasis will be placed on the state-of-the-art metrology for detecting defects and impurities using modern TEM, SIMS, and Nano-Raman methods etc. Specific areas of interest include:

  • MBE technology, 
  • nanopatterning, 
  • nanolithography, 
  • photolithography and electron lithography for the production of integrated circuits, 
  • magneto-transport at low temperatures, 
  • optical properties of nanostructures, 
  • interaction between academic and industrial research
    (instrument manufacture, IC and optoelectronics industry, and materials suppliers).

[read more...]

Jan 9, 2012

C4P: 2012 IEEE Silicon Nanoelectronics Workshop

Hilton Hawaiian Village in Honolulu, Hawaii (June 10-11, 2012)
Sponsored by the IEEE Electron Device Society
Authors are encouraged to submit a full-length paper to the IEEE Transactions on Nanotechnology or the IEEE Transactions on Electron Devices. Download the Call for Papers (PDF format) Further Information The 2012 Silicon Nanoelectronics Workshop is a satellite workshop of the 2012 VLSI Symposia sponsored by the IEEE Electron Device Society. It will be held on June 10-11, 2012 at the Hilton Hawaiian Village in Honolulu, Hawaii USA. This will be the seventeenth workshop in the annual series. Original papers on nanometer-scale devices and technologies which utilize silicon or which are based on silicon substrates are welcome. Prospective authors are requested to submit an abstract in PDF format, consisting of one page of text and one page of figures. It must include the paper title, the authors’ names and affiliation(s), and the full contact information (mailing address, phone and FAX numbers, e-mail address) for the corresponding author. Accepted abstracts will be reproduced in the workshop proceedings exactly as received. Some of the accepted papers will be presented in Poster Sessions. The deadline for receipt of abstracts is 5PM (Pacific Time) April 1, 2012. Authors will be notified by April 30, 2012.
Registration forms and hotel reservation forms will be provided in the Advanced Program of the 2012 VLSI Technology Symposium (http://www.vlsisymposium.org/index.html).
Scope:
•Sub-10 nm transistors, including those employing non-classical structures, novel channel and source/drain materials, or non-thermal injection mechanisms
•Junction and insulator materials and process technology for nanoelectronic devices
•Techniques for fabrication of nanostructures, including nanometer-scale patterning
•Physics of nanoelectronic devices, e.g. quantum effects, non-equilibrium transport
•Modeling/simulation of nanoelectronic devices, e.g. including atomistic effects
•Nanoscale surface, interface, and heterojunction effects in devices
•Device scaling issues including doping fluctuations and atomic granularity
•Circuit design issues and novel circuit architectures, including quantum computing, for nanoelectronic devices
•Optoelectronics using silicon nanostructures
•Techniques targeting zero power electronics (self-supplying), including wireless sensors, energy harvesting, steep slope devices, ultra-low power design and devices
•Devices for heterogeneous integration on silicon, including Graphene, III-V devices, CNT, spin-based devices, MEMs and NEMS, etc.
[read more...]

Sep 8, 2010

May 5, 2010

EPFL MicroNano Fabrication Annual Review Meeting

The Networking Event organized by the EPFL Center of MicroNanoTechnology (CMi)

Date: Tuesday May 18th, 2010
Time: 09h30 - 17h00
Place: EPFL Lausanne, Salle Polyvalente, Centre Est, CE 1 515

Program :
The presented topics include:
  • Biomedical Applications (Microfluidics, Cellular-Manipulation, Microelectrode Arrays, Molecules Detection, BioMicroNanoSystems, ...)
  • Optics (Nanophotonics, Optomechanics, Optofluidics, MOEMS, ...)
  • Micro and Nanoelectronics (Nanowires, High-Q Resonators, RF MEMS and Switches, 3D integration, CMOS, ...)
  • Nanostructure Physics (III/V Devices, Nanotubes, Nanowires, Nanomechanics, ...)
  • Material Sciences (Graphene, Polymers, Piezoelectric Ceramics, Photovoltaic Materials, Micro Fuel Cells, ...)
  • MEMS, NEMS (Motors, Tweezers, Sensors and Actuators, Micro and Nanomechanics, ...)
  • Micro and Nanofabrication Technologies (Self-Assembly, EBEAM Lithography, Dry Etching, Thin Films, Photolithography, FIB, CMP, ...)
  • Packaging and Assembly
Registration is required by sending an email to: claudia.dagostino@epfl.ch

Mar 30, 2009

after Analogschaltungen'09 in Hannover

The workshop program included following topics:
  • Novel CMOS/BiCMOS circuit architectures for the GHz range applications
  • Models of semiconductor devices for analog/RF (GHz range) applications
  • Influences of the system design and optimization on the components in the analog circuit applications
  • Classical and quantum mechanical effects in analog/RF nano-silicon circuits at GHz frequencies
The workshop has been organized by:
  • Prof. Dr. -Ing. Wolfgang Mathis, Leibniz Universität Hannover, Institut für Theoretische Elektrotechnik; Appelstr. 9A, 30167 Hannover
in cooperation with:
  • Prof. Dr.rer. nat. Doris Schmitt- Landsiedel, TU München; Lehrstuhl für Technische Elektronik
  • Prof. Dr. -Ing. Heinrich Klar, TU Berlin; Institut für Technische Informatik und Mikroelektronik
  • Prof. Dr.-Ing. Y. Manoli, Universität Freiburg; IMTEK