Oct 10, 2026

[OpenPDK] GT2N

This the initial release for the GT2N PDK with 72 standard cells: <https://github.com/azadnaeemi/GT2N>.
It is based on 2nm GAAFET with BSPDN. All the device models are based on 3-stack nanosheets


Standard cell layouts can also be imported using the .gds file: GT2N/gds/gt2_6t_std_cells.gdsLVS and DRC rulesets for icvalidator are present in "GT2N/icv_runset".
Libraries are composed of 3 process corners (under development), 2 nanosheet width (W) flavors, and 5 threshold voltage (VT) flavors. (In the order of decreasing VT, HVT > SVT > LVT > ULVT > ELVT)

The collaterals required for synthesis and PnR are (depending on the process corner and W/VT flavor):
LIB: GT2N/lib/tt/gt2_6t_w31_lvt_tt_0p7v25c.lib
LEF: GT2N/lef/tt/gt2_6t_w31_lvt.lef
Techlef: GT2N/techlib/gt2_tech.lef
ICT: GT2N/qrc/GT2.ict
QRCTech: GT2N/qrc/GT2_qrc.tch
ITF: GT2N/nxtgrd/GT2.itf
NXTGRD: GT2N/nxtgrd/GT2.nxtgrd

The thermal-calibrated GAAFET (3-stack nanosheet) model card is (depending on the process corner and W/VT flavor):
GT2N/device/tt/gt2_w31_lvt_tt.sp

[ref] D. Jang, P. Kumar, M. N. H. Shazon, S. J. Ram, A. Svizhenko, V. Moroz, A. Ceyhan, N. A. Radhakrishn, and A. Naeemi, "GT2N: An Open-Source 2nm Nanosheet PDK Enabling Multi-Width/VT Benchmarking" in IEEE International Symposium on Circuits and Systems (ISCAS) 2026  








Oct 9, 2026

[ICTA2026 ] Special OpenPDK Session

IEEE International Conference on Integrated Circuits, Technologies & Applications
ICTA 2026 Special Session “OpenPDK - Global FOSS Scholar Platform"
21st - 24th (Wed - Sat) October 2026
Grand Copthorne Waterfront Hotel, Singapore


The OpenPDK initiative delivers a global FOSS Scholar Platform supporting analog/RF, mixed‑signal, and digital IC design. Central to this effort are accurate SPICE models for low‑power sensing MOSFETs, RF HBTs, and emerging RRAM devices, validated across cryogenic temperatures for space and quantum‑computing applications. The initiative also advances Verilog‑A compact‑model standardization, ensuring result reproducibility and seamless integration into open‑source design flows. Supported by the EU Chips JU, OpenPDK fosters collaboration among academia, startups, and industry, while providing FOSS IC‑design tools covering schematic capture, simulation, layout, and verification up to tape‑out. Similar to the EU Chips JU program, Zhejiang CoreXin in China offers an open‑source PDK together with tape‑out services for its 55nm CMOS process. To accelerate the semiconductor‑industry development across the Asia‑Pacific and Southeast‑Asia regions, semiconductor model development and parameter extraction techniques should be pursued in a more focused manner. This special session brings together experts to present and discuss advances in device characterization, compact modeling, simulation methodologies, and validation techniques for a broad range of solid‑state devices, including Si, III/V semiconductors, power devices, nanoscale structures, and emerging 2.5D/3D advanced packaging technologies [ read more...]

ICTA 2026 Special OpenPDK Session Presenters
  • SPICE/Verilog-A standard models and OpenPDK practice
    Wladek Grabinski, GMC Consulting, Switzerland
  • Open-Source Ecosystem Updates and Semiconductor Design Development Programs in Japan
    Jun-ichi Okamura, AIST Solutions, OpenSUSI, Japan
  • Open-Source EDA Meets Industrial IC Design
    Ehrenfried Seebacher, ams-OSRAM AG, Austria
  • Building an Open-Source Process Platform, Empowering VLSI Innovation and Development
    Da Zhang, Zhejiang University/CTO, Zhejiang Chuangxin Integrated Process Platform, China
  • From Silicon to Design: Intelligent Measurement and Modeling for DTCO
    Yutao Ma, VP of R&D, Primarius Technologies. Ltd. China
  • Beyond Moore, Application-Driven IC Innovation International Cooperation Opportunities at NICE
    Alex Gu, National Innovation Center Par Excellence (NICE), China
  • 2.5D/3D IC: AI+EDA Reshaping the System-Design-Technology Co0ptimization (STCO) Paradigm for Advanced Packaging
    Alex Zhao, Founder/CEO Zhuhai SiChip Technology Co., Ltd., China
  • Modelling of semiconductor devices: the heart of innovation bridging academia and industrial applications
    Fujiang Lin, University of Science and Technology of China (USTC), China
Special OpenPDK Session progeam include the panel discussion: 
How to have a close loop for PDK, EDA, PDA and ICS simulation?

[conference] ELECTRONICS 2026 at KTU Kaunas

International Conference ELECTRONICS 2026
From SMT to Advanced Packaging – Manufacturing Meets Microinterconnects
KTU Kaunas, Lithuania
12–13 November 2026



Conference Vision : A joint platform connecting SMT engineers, advanced packaging researchers, reliability specialists, and industry to build a shared technical language, bridge research and manufacturing, and grow German-Baltic collaboration around heterogeneous integration and microinterconnects. Organized by Kaunas University of Technology, the conference serves as a platform for collaboration and discussion among representatives from academy, industry, and business.

Partners:
TUD IAFT (Dresden University of Technology, Institute of Electronic Packaging Technology)
IHP (IHP GmbH, Leibniz Institute for High Performance Microelectronics)
Industry Partners: FINETECH, TELTONIKA, etc.

Conference Program Online <https://eef.ktu.edu/events/electronics2026/>

Conference Organzation Committee:

General Chair
Prof., Dr. Mindaugas ŽILYS, KTU Kaunas

Executive Chair
Dr. Agata ROMANOVA, KTU Kaunas

Co-Chairs
Prof., Dr. Algimantas VALINEVIČIUS, KTU Kaunas
Prof., Dr. Darius ANDRIUKAITIS, KTU Kaunas
Prof., Dr. Dangirutis NAVIKAS, KTU Kaunas

Oct 8, 2026

Schematic to Silicon with Mini MOSbius

Zero To ASIC Course and Tiny Tapeout by Matt Venn
Schematic to Silicon with Mini MOSbius 
https://www.youtube.com/watch?v=NM5cLWYWqG0

MOSbius

Take Matt Venn TT course: 
https://www.zerotoasiccourse.com/
Buy a copy of Mini MOSbius, part of the TT IP library, here: 
https://store.tinytapeout.com/products/TTSKY25b-Development-Kit-p849160072
Check the configurator: 
https://github.com/mattvenn/mini-mosbius-configurator

Mini MOSbius is available on these chips
  • [OK] TTSKY25a - delivered July 2026 - available in the store
  • [OK] TTSKY25b - delivered August 2026 - available in the store
  • TTSKY26b - tapeout May 2026
  • TTSKY26c - tapeout September 2026
  • GF180 - will be taped out December 2026
and finally check out the original MOSBius: https://mosbius.org/ If you are interested to acquire MOSbius kits, review the express license and email Peter Kinget for kit availability before placing an order.


[poster] Active Cantilever with Dual Actuator

Bartosz Pruchnik1, Fabian Dietrich2, Richard Subianto2, Katerina Ivanova2, Athulya K. Muraleedharan Bindu2, Hans-Georg Pietscher2, Javad Basseri2, Muralikrishnan Brajesh Kaimal2, Władysław Kopczyński1, Wojciech Godlewski1, Dominik Badura1, Piotr Putek1, Krzysztof Kwoka1, Piotr Smagowski1, Andrew Yacoot3, Tomasz Piasecki1, Fangzhou Xia4, Ivo W. Rangelow2 
Active Cantilever with Dual Actuator
52nd International Micro and Nano Engineering Conference
Sep. 21-24, 2026 Interlaken (CH)
MEN2026 Poster S05A-T2-P-5

1. Wrocław University of Science and Technology,
2. nano analytik GmbH, 
3. National Physical Laboratory
4. University of Texas at Austin

Abstract: Atomic Force Microscopy (AFM) is often limited by the speed and bandwidth of three main components: the cantilever, the scanner, and the controller. Recent microelectromechanical systems (MEMS) have improved the performance of the cantilever and scanner by combining high-speed active cantilevers with low-latency scanners. In this work, we present a standardized active cantilever design. The system combines a large cantilever that acts as a Z-axis actuator with a smaller active cantilever sensor that provides a bandwidth greater than 400kHz. The smaller cantilever is integrated into the larger structure, creating a compact and highly responsive device. We introduce a new active cantilever architecture that uses two integrated electrothermal actuators. One actuator is used for cantilever operation, while the second provides vertical (Z-axis) movement for surface tracking. This design allows AFM measurements to be performed without the need for an external piezoelectric z-actuator.


Acknowledgements: This work was supported by the European Union's Horizon Europe research and innovation program under the Marie Sklodowska-Curie grant agreement No 101072775, and by the National Science Centre, Poland (grant No. 2021/41/B/ST7/03144).