[paper] SPICE simulation of PIN diodes and IGBT devices

Manhong Zhang, Yi Zhai

Recovering the carrier number conservation in SPICE simulation of PIN diodes and IGBT devices

Solid-State Electronics

Available online 7 February 2022, 108239

DOI: 10.1016/j.sse.2022.108239

   
North China Electric Power University, Beijing 102206, China

Abstract: In SPICE simulations of PIN diodes and IGBT devices using finite difference method, one discretizes an undepleted N- region into several equally spaced nodes with a time-dependent distance of Δx(t). Then transforms the ambipolar diffusion equation, a time-space partial differential equation, into a set of time-dependent ordinary differential equations. However, the time-dependent property of Δx(t) destroys the carrier number conservation. In this paper, we propose an approach to account for the effect of the Δx(t) by introducing an auxiliary system. It has the same total current and the total carrier number in the undepleted N- region as the real system, but has different electron and hole current components. The difference is caused by adding compensation current terms with the equal amplitude and opposite sign to the electron and hole current terms in the auxiliary system. These compensation current terms are proportional to the boundary speed of the undepleted N- region and do not change the total current. The auxiliary system can be easily solved using SPICE behavior models and its carrier density is a good approximation to the real one. Our simulations show that the compensation current correction is important for fast switching PIN diodes, but may not be very important in IGBT devices due to their large gate-related capacitance.

FIG: SPICE simulation model of PIN diodes and IGBT devices

[paper] IGBT Compact Modeling

Compact Modeling of IGBT Charging/Discharging for Accurate Switching Prediction

Y. Miyaoku¹, A. Tone¹, K. Matsuura¹, M. Miura-Mattausch¹ (Fellow, IEEE),

H. J. Mattausch¹ (Senior Member, IEEE), and D. Ikoma²

IEEE J-EDS, vol. 8, pp. 1373-1380, 2020

doi: 10.1109/JEDS.2020.3008919

1 Graduate School of Advanced Sciences of Matter, Hiroshima University, Higashi-Hiroshima 739-8527, Japan
2 Sensor and Semiconductor Development, Denso Corporation, Aichi 448-8661, Japan

ABSTRACT The trench-type IGBT is one of the major devices developed for very high-voltage applications, and has been widely used for the motor control of EVs as well as for power-supply systems. In the reported investigation, the accurate prediction of the power dissipation of IGBT circuits has been analyzed. The main focus is given on the carrier dynamics within the IGBTs during the switching-off phase. It is demonstrated that discharging and charging at the IGBT’s gate-bottom-overlap region, where electron discharging is followed by hole charging, has an important influence on the switching performance. In particular, the comparison of long-base and short-base IGBTs reveals, that a quicker formation of the neutral region within the resistive base region, as occurring in the long-base IGBT, leads to lower gatebottom-overlap capacitance, thus realizing faster electron discharging and hole charging of this overlap region.

FIG: IGBT structures with nMOSFET + pnp BJT part (a. and b.) and nMOSFET-only structure (c.). The X–Y line is through the middle of the bottom-gate oxide and the A–B line is directly underneath the bottom-gate oxide.

Received 14 May 2020; revised 2 July 2020; accepted 8 July 2020. Date of publication 13 July 2020; date of current version 8 December 2020. The review of this article was arranged by Editor M. Mierzwinski. Digital Object Identifier 10.1109/JEDS.2020.3008919

[paper] Parameter Extraction Technique for IGBT Compact Model

N.V. Bharadwaj¹, Dr. P. Chandrasekhar² and Dr. M. Sivakumar³

A Consecutive Parameter Extraction Technique for IGBT Compact Model

ICMM-2019; AIP Conf. Proc. 2269, 030031-1–030031-5;

DOI: 10.1063/5.0019484

¹Geethanjali College of Enegineering and Technology, Hyderabad, 501301, India 

²MGIT, Hyerabad, 500075, India 

³Gudlavalleru Engineering College, Gudlavalleru , 521356, India

Abstract: A consecutive parameter extraction technique describes the fitting target related parameters for Insulated-gate bipolar transistor (IGBT) model. The IGBT model has been represented by a couple of simplified equivalent circuits. Using simulated data for a trench-type IGBT as reference the performance of compact model IGBT is compared to an IGBT macro model. Due to physics based modeling, parameter extraction with the compact model is fast. With very less extraction effort, the compact model fits the dc current and capacitance characteristics accurately.

FIG: The IGBT cell structure with cell pitch = 4μm and trench gate depth = 3μm

[paper] Compact Models for IGBTs

Advanced physics-based compact models for new IGBT technologies

Arnab Biswas, Maria Cotorogea

Infineon Technologies AG, Germany

Abstract The TRENCHSTOP™ IGBT7 technology is based on the latest micro-pattern trench technology. It provides strongly reduced losses offering a high level of controllability [1]. This technology brings forward new challenges in compact modelling. Current IGBT compact models at Infineon are physics-based subcircuit representations in SPICE syntax. They were developed to run in the circuit simulator SIMetrix, and are manually calibrated. The aim of this work is to present advanced models for the micro-pattern trench IGBT implemented in Verilog-A language, addressing the challenges of compact models in terms of calibration accuracy, simulation run time, model robustness and portability to multiple simulators.

Fig. 3: IGBT technology overview showing schematically

the static excess-carrier density distribution in the plasma region.

[paper] Compact Modeling of IGBT

Y. Miyaoku, A. Tone, K. Matsuura, M. Miura-Mattausch, H. J. Mattausch, and *D. Ikoma

Compact Modeling of IGBT Charging/Discharging

for Accurate Switching Prediction

IEEE J-EDS,  DOI:10.1109/jeds.2020.3008919 

Graduate School of Advanced Sciences of Matter, Hiroshima University, Japan

*Denso Corp., Aichi, Japan

Abstract: The trench-type IGBT is one of the major devices developed for very high-voltage applications, and has been widely used for the motor control of EVs as well as for power-supply systems. In the reported investigation, the accurate prediction of the power dissipation of IGBT circuits has been analyzed. The main focus is given on the carrier dynamics within the IGBTs during the switching-off phase. It is demonstrated that discharging and charging at the IGBT’s gate-bottom-overlap region, where electron discharging is followed by hole charging, has an important influence on the switching performance. In particular, the comparison of long-base and short-base IGBTs reveals, that a quicker formation of the neutral region within the resistive base region, as occurring in the long-base IGBT, leads to lower gatebottom-overlap capacitance, thus realizing faster electron discharging and hole charging of this overlap region.

Fig: Studied IGBT structure with indicated current flows

MicroTec: Semiconductor Process and Device Simulator

Software Package for 2D Process and Device Simulation

Version 4.0 for Windows

User’s Manual

Publisher: Siborg Systems Inc

Editor: Michael S. Obrecht

MicroTec allows 2D silicon process modeling including implantation, diffusion and oxidation and 2D steady-state semiconductor device simulation like MOSFET, DMOS, JFET, BJT, IGBT, Schottky, photosensitive devices etc. Although MicroTec is significantly simplified compared to widely available commercial simulators, it nevertheless is a very powerful modeling tool for industrial semiconductor process/device design. In many instances MicroTec outperforms existing commercial tools and it is remarkably robust and easy-to-use.

FIG: MicroTec SibGraf GUI windows

[Final Program] 11th International Workshop on Compact Modeling

11th International Workshop on Compact Modeling (IWCM 14)

January 23 (Thursday), 2014

Suntec Singapore Convention and Exhibition Centre (Room 309)

Workshop Program

9:00-9:10am Welcome address
Mansun Chan (workshop chair)

Session I: Modeling for Compact Semiconductor
Session Chair: Lining Zhang

9:10-9:35am Challenges and Prospects of Compact Modeling for Future Generation III-V/Si Co-integrated ULSI Circuit Design
Xing Zhou, Siau Ben Chiah, Binit Syamal, Hongtao Zhou, Arjun Ajaykumar, and Xu Liu; Nanyang Technological University, Singapore
9:35-10:00am A Large Signal Model for InP/InGaAs Double Heterojunction Bipolar Transistors
Yan Wang and Yuxia Shi; Tsinghua University, China
10:00-10:25am Analytical Modeling for AlGaN/GaN HEMTs
Aixi Zhang, Lining Zhang, Zhikai Tang, Xiaoxu Cheng*, Yan Wang*, Kevin J. Chen, and Mansun Chan; The Hong Kong University of Science and Technology, Hong Kong, China; *Tsinghua University, China

10:25-10:40am Break

Session II: Non-Classical Device Modeling and Platform
Session Chair: Xing Zhou

10:40-11:05am Developing i-MOS as a Compact Model Standardization Platform
Lining Zhang and Mansun Chan; The Hong Kong University of Science and Technology, Hong Kong, China
11:05-11:30am An Analytic Model for Nanowire Tunnel-FETs
Ying Liu, Jin He, Mansun Chan*, Caixia Du**, Yun Ye, Wei Zhao, Wen Wu and Wenping Wang; Peking University Shenzhen SOC Key Laboratory, China; *The Hong Kong University of Science and Technology, Hong Kong, China; **Shenzhen Huayue Teracale Chip Electronic Limited Co., China
11:30-11:55am A Channel Potential Based Model for SiO2- Core Si-Shell SRGMOSFET
Xiangyu Zhang, Jin He, Mansun Chan*, Caixia Du**, Yun Ye, Wei Zhao, Wen Wu and Wenping Wang; Peking University Shenzhen SOC Key Laboratory, China; *The Hong Kong University of Science and Technology, Hong Kong, China; **Shenzhen Huayue Teracale Chip Electronic Limited Co., China

11:55am-2:00pm Lunch

Session III: Power Device Modeling
Session Chair: Young June Park

2:00-2:25pm Compact Modeling of the Reverse Recovery Effect in LDMOS Body Diode (Invited)
M. Miyake; Hiroshima University, Japan
2:25-2:50pm Compact Modeling of the SiC IGBT Including the Switching at High Temperature
K. Matsuura, M. Miura-Mattausch, M. Miyake and H. J. Mattausch; Hiroshima University, Japan
2:50-3:15pm Experimental Verification of Power MOSFET Model under Switching Operations
A. Saito, M. Miura-Mattausch, M. Miyake, T. Umeda and H.J. Mattausch; Hiroshima University, Japan

3:15-3:30pm Break

Session IV: Reliability Modeling
Session Chair: Jin He

3:30-3:55pm 3D Monte Carlo Reaction-Diffusion Simulation Framework to model Time Dependent Dielectric Breakdown in BEOL Oxide
Seong Wook Choi and Young June Park; Seoul National University, Korea
3:55-4:20pm Development of NBTI and Channel Hot Carrier (CHC) Effect Models and their Application for Circuit Aging Simulation
Chenyue Ma, Hans Jürgen Mattausch, Kazuya Matsuzawa*, Seiichiro Yamaguchi*, Teruhiko Hoshida*, Masahiro Imade*, Risho Koh*, Takahiko Arakawa* and Mitiko Miura-Mattausch; Hiroshima University, Japan; * Semiconductor Technology Academic Research Center, Japan
4:20-4:45pm Modeling of the Surface Charges on Au Electrode Including Pseudocapacitance
Jooseong Kwon, Intae Jeong, Sungwook Choi and Young June Park; Seoul
National University, Korea

4:45-4:55pm Closing Remarks
Hans Juergen Mattausch (workshop co-chair)