[Si2 CMC] to Standardize SPICE Model for SiC MOSFET

May 03, 2021 // By Peter Clarke [eenewsanalog.com] 

The Compact Model Coalition (CMC) working group of the Silicon Integration Initiative (SI2) has agreed to standardize a model for the behaviour of a silicon-carbide MOSFET.

Silicon-carbide offers higher efficiency and faster operation than silicon and has been adopted for several power applications including photovoltaic inverters and converters, industrial motor drives, electric vehicle powertrain and EV charging, and power supply and distribution. A CMC working group will oversee the model development with Analog Devices, Cadence Design Systems, Infineon, Qualcomm, Siemens EDA, Silvaco and Synopsys set to participate.

"I'd encourage companies with a stake in silicon-carbide devices to join this effort and help guide selection of the model which best represents their intended use," 

advised Peter Lee, chair of the CMC.

Now in its 25th year, the Si2 Compact Model Coalition provides semiconductor manufacturers, designers, and simulation tool providers a means to pool resources to fund standardization and optimization of standard compact SPICE models and standard interfaces to promote simulation tool interoperability [Read more...]

CMC Leadership

CMC Leadership represents the industry’s top semiconductor design companies and manufacturers.

In their role, they provide overall direction and guidance to the efforts of the members and the developers involved in CMC working groups.

Chair: Dr. Peter Lee, Micron Technology

Vice-Chair: Dr. Josef Watts, GLOBALFOUNDRIES

Secretary Richard Williams, IBM

Treasurer: Takeshi Naito, Toshiba

[read more...]

IEDM: Modeling and Simulation – Compact Modeling

 IEEE International Electron Devices Meeting (IEDM) is the world’s preeminent forum for reporting technological breakthroughs in the areas of semiconductor and electronic device technology, design, manufacturing, physics, and modeling. IEDM is the flagship conference for nanometer-scale CMOS transistor technology, advanced memory, displays, sensors, MEMS devices, novel quantum and nano-scale devices and phenomenology, optoelectronics, devices for power and energy harvesting, high-speed devices, as well as process technology and device modeling and simulation. This year IEDM technical program also includes a series of the compact modeling papers:

[9.6] GaNFET Compact Model for Linking Device Physics, High Voltage Circuit Design and Technology Optimization, U. Radhakrishna, S. Lim, P. Choi, T. Palacios, and D.A Antoniadis, Massachusetts Institute of Technology
[28.1] Transport Mechanism in sub 100C Processed High Mobility Polycrystalline ZnO Transparent Thin Film Transistors, P.B. Pillai, and M.M. De Souza, University of Sheffield
[28.2] Physical-based Analytical Model of flexible a-IGZO TFTs Accounting for Both Charge Injection and Transport, M. Ghittorelli, F. Torricelli, J.L. Van Der Steen*, C. Garripoli**, A. Tripathi*, G. Gelinck*, E. Cantatore**, Z. Kovacs-Vajna, University of Brescia, *Holst Centre, TNO, **Eindhoven University of Technology
[28.3] Predictive Compact Modeling of Random Variations in FinFET Technology for 16/14nm Node and Beyond, X. Jiang, X. Wang*, R. Wang, B. Cheng**, A. Asenov*, and R. Huang, Peking University, *University of Glasgow, **Gold Standard Simulations (GSS) Ltd.
[28.4] A New Surface Potential Based Physical Compact Model for GFET in RF Applications, L. Wang, S. Peng, Z. Zong, L. Li, W. Wang, G. Xu, N. Lu, Z. Ji, and M. Liu, Chinese Academy of Sciences
[28.5] Physics-based Compact Modeling Framework for State-of-the-Art and Emerging STT-MRAM Technology, N. Xu, J. Wang, Y. Lu, H.-H. Park, B. Fu, R. Chen, W. Choi, D. Apalkov, S. Lee*, S. Ahn*, Y. Kim*, Y. Nishizawa**, K.-H. Lee, Y. Park, Samsung Semiconductor Inc, *Samsung Electronics, **Samsung R&D Institute Japan
[28.6] Physics-based Compact Modeling of Charge Transport in Nanoscale Electronic Devices (Invited), S. Rakheja, and D. Antoniadis*, New York University, *Massachusetts Institute of Technology

The compact/SPICE modeling and its Verilog-A standardization will be also discussed at two following engineering events organized by MOS-AK Group and the CMC which are collocated with the IEDM in Washington DC in December, later this year.

[online MOS-AK and CMC registration]

• MOS-AK Workshop in Washington DC (Dec.9) 
• http://www.mos-ak.org/washington_dc_2015/
• CMC Meeting at Sheraton Suites Old Town Alexandria (Dec.10-11)
• https://www.si2.org/openeda.si2.org/4Q_2015_CMC_Meeting.php