[paper] Modeling a 2D Electrostatic Potential in MOS Devices

Francois Lim, Benjamin Iñiguez, Alexander Kloes

A new analytical method for modeling a 2D electrostatic potential in MOS devices, 

applicable to compact modeling

J. Appl. Phys. 28 January 2024; 135 (4): 044501

DOI: 10.1063/5.0188863

Abstract: This paper presents a new conformal mapping method to solve 2D Laplace and Poisson equations in MOS devices. More specifically, it consists of an analytical solution of the 2D Laplace equation in a rectangular domain with Dirichlet boundary conditions, with arbitrary values on the boundaries. The advantages of the new method are that all four edges of the rectangle are taken into account and the solution consists of closed-form analytical expressions, which make it fast and suitable for compact modeling. The new model was validated against other similar methods. It was found that the new model is much faster, easier to implement, and avoids many numerical issues, especially near the boundaries, at the cost of a very small loss in accuracy.

FIG: (a) The calculated 2D potential from the closed-form analytic model,
for a Double Gate MOSFET with tsc=12nm, tox=1.6nm, and L=25nm.
(b) Corresponding equipotentials. 

Acknowledgments: This work was funded by the Spanish Ministry of Science through Contract No. PRX21/00726.

Symposium on Schottky Barrier MOS Devices 2018

"devil of savior"

It is the 40th anniversary of Institut für Halbleitertechnik und Nanoelektronik (IHTN) of the TU Darmstadt, Germany. In addition to many activities in September, a small symposium on Schottky Barrier MOS (SB-MOS) devices is planned for August 7th in Darmstadt. This is the second meeting of an enthusiastic group of Schottky barrier researchers and this year it is sponsored by the EDS German chapter and hosted by the IHTN of TU Darmstadt.

This year the symposium is organized by Dr. Tillmann Krauss, Dr. Udo E. Schwalke, Dr. Mike Schwarz and the staff of the TU Darmstadt. The symposium starts at 11:00 am in the lecture hall at the ITHN TU Darmstadt. 

The following agenda is planned:






AGENDA:

11:00 – 11:15 Welcome and introduction by Prof. Schwalke
11:15 – 11:30 “Wrap-Up of Schottky Barrier Simulation Methodologies”, Dr. Mike Schwarz (Robert Bosch GmbH, NanoP THM) (15mins)
11:30 – 12:00 “DC/AC compact modeling of Tunnel-FETs”, Prof. Alexander Kloes (NanoP THM) (30mins)
12:00 – 12:30 “Benefits of Schottky Barrier vs. Conventional Doped Source/Drain MOS devices”, Dr. John Snyder (JCap, LLC) (30mins)
12:30 – 13:30 “Lunch”
13:30 – 14:00 “Nanowire Schottky devices”, Dr. Walter Weber (TU Dresden) (30mins)
14:00 – 14:30 “Nanoelectronics: From Silicon to Carbon”, Prof. Udo Schwalke (TU Darmstadt) (30mins)
14:30 – 14:45 “Coffee Break”
14:45 – 15:15 “Transfer-free fabrication of nanocrystalline graphene field-effect sensors”, Dennis Noll (TU Darmstadt) (30mins)
15:15 – 15:45 “Modeling of neuromorphic devices”, Dr. Laurie E. Calvet (Université Paris-Sud) (30mins)

Attendees are welcome to attend the symposium. Further information are present at http://www.iht.tu-darmstadt.de/ihtn_institute/

Yannis Tsividis' Early Contributions to MOS Filters

In the 1970s, when the bipolar transistor was the undisputed king of analog integrated circuits (ICs), most electrical engineers regarded the MOS transistor as a second-rate device for ICs: it was a good switch, but a mediocre amplifier. As a graduate student at UC Berkeley, under the supervision of Paul Gray, Yannis Tsividis had a very different vision. He saw the MOS transistor as the future star for mixed-signal ICs and was excited to prove to the world he was right. The opening gambit was his thesis work demonstrating the first fully-integrated MOS opamp. This single achievement propelled him to the top of his generation of researchers and earned him a Berkeley PhD degree, a teaching appointment at Columbia University and a consulting position at Bell Laboratories.

[read more...]
REF:
Khoury, J.; Banu, M., "Yannis Tsividis' Early Contributions to MOS Filters," Solid-State Circuits Magazine, IEEE , vol.6, no.4, pp.36,40, Fall 2014
doi: 10.1109/MSSC.2014.2347772