Showing posts with label FD-SOI. Show all posts
Showing posts with label FD-SOI. Show all posts

Dec 31, 2025

[paper] 60GHz Class-AB PA in 22nm FD-SOI CMOS

Dimitrios Georgakopoulos, Vasileios Manouras and Ioannis Papananos
A 60-GHz Current Combining Class-AB Power Amplifier in 22 nm FD-SOI CMOS
Microwave 2026, 2(1), 2; DOI: 10.3390/microwave2010002

* School of Electrical and Computer Engineering, National Technical University of Athens, (GR)

Abstract: This work presents a fully integrated, two-stage, deep class-AB power amplifier (PA) operating at a center frequency of 60 GHz. High efficiency and suppression of third-order intermodulation products are targeted, achieving improved linearity compared to reported state-of-the-art designs. A current combining architecture is also employed to enhance the output power capability. The PA is designed in a 22 nm FD-SOI CMOS technology and is optimized through a complete schematic-to-layout design flow. Post-layout simulations indicate that the PA achieves a peak power-added efficiency (PAE) of 28%, a saturated output power ( π‘ƒπ‘ π‘Žπ‘‘ ) of 20.2 dBm, and a maximum large-signal gain (πΊπ‘šπ‘Žπ‘₯ ) of 19.6 dB at 60 GHz, evaluated at an operating temperature of 60 °C. The design maintains high linearity across the targeted output power range, exhibiting effective suppression of third-order intermodulation distortion (IMD3), which enhances its suitability for spectrally efficient modulation schemes. 

FIG: Top-level schematic of the overall mm-Wave PA, including layout of all passive networks


Jul 17, 2020

[paper] FD-SOI CMOS RF FoM

28-nm FD-SOI CMOS RF Figures of Merit Down to 4.2 K
Lucas Nyssens1 (Graduate Student Member, IEEE), Arka Halder1, Babak Kazemi Esfeh1,
Nicolas Planes2, Denis Flandre1 (Senior Member, IEEE), Valeriya Kilchytska1
and Jean-Pierre Raskin1 (Fellow, IEEE)
IEEE J-EDS, vol. 8, pp. 646-654, 2020,
DOI: 10.1109/JEDS.2020.3002201
1UCL, 1348 Louvain-la-Neuve (B) 2ST-Microelectronics, 38920 Crolles (F)

Abstract: This work presents a detailed RF characterization of 28nm FD-SOI nMOSFETs at cryogenic temperatures down to 4.2K. Two main RF Figures of Merit (FoMs), i.e., current-gain cutoff frequency (fT) and maximum oscillation frequency (fmax), as well as parasitic elements of the small-signal equivalent circuit, are extracted from the measured S-parameters. An improvement of up to ∼130GHz in fT and ∼75GHz in fmax is observed for the shortest device (25nm) at low temperature. The behavior of RF FoMs versus temperature is discussed in terms of small-signal equivalent circuit elements, both intrinsic and extrinsic (parasitics). This study suggests 28nm FD-SOI nMOSFETs as a good candidate for future cryogenic applications down to 4.2K and clarifies the origin and limitations of the performance.
FIG: Small-signal equivalent circuit of the RF MOSFETs

Aknowledgement: This work was supported in part by Eniac “Places2Be” and in part by Ecsel “Waytogofast” Projects. The work of Lucas Nyssens was supported by the Fonds de la Recherche Scientifique - FNRS. This paper is based on a paper entitled “28 FDSOI RF Figures of Merit Down to 4.2 K,” presented at the 2019 IEEE S3S Conference.