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Nanoscale Electronic Device Applications of Carbon Nanotubes,

Graphene, Silicene and Molybdenum Disulfide

[paper] p-Type Doped Silicene-based

Mu Wen Chuan, Munawar Agus Riyadi, Afiq Hamzah, Nurul Ezaila Alias, Suhana Mohamed Sultan, Cheng Siong Lim, Michael Loong Peng Tan

Device performances analysis of p-type doped silicene-based field effect transistor using SPICE-compatible model

PLoS ONE 17(3): e0264483.: March 3, 2022

DOI: 10.1371/journal.pone.0264483

   
Universiti Teknologi Malaysia, Skudai, Johor, Malaysia
Diponegoro University, Semarang, Indonesia

Abstract: Moore’s Law is approaching its end as transistors are scaled down to tens or few atoms per device, researchers are actively seeking for alternative approaches to leverage more-than-Moore nanoelectronics. Substituting the channel material of a field-effect transistors (FET) with silicene is foreseen as a viable approach for future transistor applications. In this study, we proposed a SPICE-compatible model for p-type (Aluminium) uniformly doped silicene FET for digital switching applications. The performance of the proposed device is benchmarked with various low-dimensional FETs in terms of their on-to-off current ratio, subthreshold swing and drain-induced barrier lowering. The results show that the proposed p-type silicene FET is comparable to most of the selected low-dimensional FET models. With its decent performance, the proposed SPICE-compatible model should be extended to the circuit-level simulation and beyond in future work.

Fig: Schematic diagrams of AlSi3 FET: (a) the structure and 

(b) the ToB nanotransistor circuit model. 

Acknowledgements: 1.) Michael Tan Loong Peng - Ministry of Higher Education (MOHE) of Malaysia through the Fundamental Research Grant Scheme(FRGS/1/2021/ STG07/ UTM/02/3); The funders had no role in study design, data collection and analysis, decision to publish, or preparation of the manuscript. 2.) Munawar Agus Riyadi - World Class Research Universitas Diponegoro (WCRU) 2021 Grant no. 118-16/UN7.6.1/PP/2021; The funders had no role in study design, data collection and analysis, decision to publish, or preparation of the manuscript.

[paper] CV of Graphene–Silicon Heterojunction Photodiodes

Sarah Riazimehr,  Melkamu Belete,  Satender Kataria,  Olof Engström and Max Christian Lemme

Capacitance–Voltage (C –V) Characterization 

of Graphene–Silicon Heterojunction Photodiodes

Advanced Optical Materials 

First Published Open Access: 07 May 2020

DOI: 10.1002/adom.202000169

Abstract: Heterostructures of 2D and 3D materials form efficient devices for utilizing the properties of both classes of materials. Graphene/silicon (G/Si) Schottky diodes have been studied extensively with respect to their optoelectronic properties. Here, a method to analyze measured capacitance–voltage (C –V) data of G/Si Schottky diodes connected in parallel with G/silicon dioxide/Si (GIS) capacitors is introduced. The accurate extraction of the built‐in potential (Φbi) and the Schottky barrier height (SBH) from the measurement data independent of the Richardson constant is also demonstrated.

Figure 2

Fig.: a) Cross section of the test device showing both MIS and GIS regions. b) Small‐signal C –V characteristics of Dtest (line) compared to a theoretically calculated C –V curve (dashed ) at 10 kHz.

Acknowledgements: Financial support from the European Commission (Graphene Flagship, 785219, 881603) and the German Ministry of Education and Research, BMBF (GIMMIK, 03XP0210) is gratefully acknowledged.

[paper] Graphene/4H-SiC/Graphene MSM UV-photodetector

An optimized Graphene/4H-SiC/Graphene MSM UV-photodetector operating
in a wide range of temperature 

H. Bencherif ¹, L. Dehimi1 ², G. Messina ³, P. Vincent ⁴, F. Pezzimenti ³, F. G. Della Corte ^{3 1}Laboratory of Metallic and Semiconductor Materials, University of Biskra, Biskra, DZ

²Faculty of Science, University of Batna 1, DZ

³DIIES, Mediterranea University of Reggio Calabria, Reggio Calabria, IT

⁴School of Electronics Engineering, KNU, 80 Daehakro, Buk-gu, Daegu, 702-701, KP

Abstract: In this paper, .an accurate analytical model has been developed to optimize the performance of an Interdigitated Graphene Electrode/p-silicon carbide (IGE/p-4H-SiC) Metal semiconductor Metal (MSM) photodetector operating in a wide range of temperatures. The proposed model considers different carrier loss mechanisms and can reproduce the experimental results well. An overall assessment of the electrodes geometrical parameters’ influence on the device sensitivity and speed performances was executed. Our results confirm the excellent ability of the suggested Graphene electrode system to decrease the unwanted shadowing effect. A responsivity of 238 μA/W was obtained under 325-nm illumination compared to the 16.7 μA/W for the conventional Cr-Pd/p-SiC PD. A photocurrent to- dark-current ratio (PDCR) of 5.75 × 105 at 300K and 270 at 500K was distinguished. The response time was found to be around 14 μs at 300K and 54.5 μs at 500K. Furthermore, the developed model serves as a fitness function for the multi objective optimization (MOGA) approach. The optimized IGE/p-4H-SiC MSM-PD design not only exhibits higher performance in terms of PDCR (7.2×105), responsivity (430A/cm2) and detectivity (1.3×1014 Jones) but also balances the compromise between ultrasensitive and high-speed figures of merit with a response time of 4.7 μs. Therefore, the proposed methodology permits to realize ultra-sensitive, high-speed SiC optoelectronic devices for extremely high temperature applications. 

FIG: a) Energy band diagram of Graphene/p-SiC/Graphene structure, b) Cross-sectional view of the suggested IGE/4H-SiC MSM UV-PD with interdigitated electrodes

Acknowledgments: This work was supported by DGRSDT Of Ministry of Higher education of Algeria. The work was done in the unit of research of materials and renewable energies (URMER).

Germany’s RWTH Aachen University and AMO launch joint Aachen Graphene & 2D-Materials Center

RWTH Aachen University and AMO GmbH in Germany have launched a new joint research center with a focus on efficiently bridging the gap between fundamental science and applications within graphene and related materials-based electronics and photonics.

Sharing the vision of bringing graphene and related materials research from the lab into applications, the five founding principal investigators of the Aachen Graphene and 2D-Materials Center (who are also all members of the EU-funded Graphene Flagship project) are professor Christoph Stampfer (of RWTH, and spokesman for the center), professor Max Lemme (of AMO and RWTH), professor Markus Morgenstern (of RWTH), professor Renato Negra (of RWTH) and Dr Daniel Neumaier (of AMO).

“The center will help to turn the exciting properties of graphene and 2D [two-dimensional] materials into true functions, making these materials not only fascinating for scientists but also serving society,” said Christoph Stampfer following the center’s kick-off meeting on 24 July. “With the Aachen Graphene and 2D-Material Center, we aim at increasing the visibility of Aachen as an excellent place to undertake graphene and 2D material research with both a fundamental and applied focus.”

The center enables the integration of the already ongoing work from RWTH Aachen University and AMO under a legal framework that allows for full collaboration between the groups. In particular, the center will focus on addressing the challenges of future technology including high-frequency electronics, flexible electronics, energy-efficient sensing, photonics as well as spintronics and valleytronics with graphene and related materials and their heterostructures.

Founding Members of the Aachen Graphene and 2D Materials Center:

• Prof. Christoph Stampfer, RWTH Aachen University (Spokesman)
• Prof. Max Lemme, RWTH Aachen University/AMO GmbH
• Prof. Markus Morgenstern , RWTH Aachen University
• Prof. Renato Negra, RWTH Aachen University
• Dr. Daniel Neumaier, AMO GmbH