An Efficient Robust Algorithm for the Surface-Potential Calculation of Independent DG MOSFET
Jandhyala, S. Mahapatra, S.Page(s): 1663 - 1671
Digital Object Identifier : 10.1109/TED.2011.2131654
Although the recently proposed single-implicit-equation-based input voltage equations (IVEs) for the independent double-gate (IDG) MOSFET promise faster computation time than the earlier proposed coupled-equations-based IVEs, it is not clear how those equations could be solved inside a circuit simulator as the conventional Newton–Raphson (NR)-based root finding method will not always converge due to the presence of discontinuity at the G-zero point (GZP) and nonremovable singularities in ... Read More »
Page(s): 1672 - 1680
Digital Object Identifier : 10.1109/TED.2011.2131144
Statistical Model of Line-Edge and Line-Width Roughness for Device Variability Analysis
Hiraiwa, A. Nishida, A. Mogami, T.Page(s): 1672 - 1680
Digital Object Identifier : 10.1109/TED.2011.2131144
The authors propose a model of line-edge and line-width roughness (LER and LWR) of actual device patterns, which received some smoothing steps, for accurate estimation of device variability. The model assumes that LER/LWR has originally an exponential autocorrelation function (ACF) and is smoothed using another exponential function. The power spectrum of this ACF almost completely fits the experimental one of polycrystalline silicon lines, which were formed using plasma etching. The authors inve... Read More »
Page(s): 1710 - 1721
Digital Object Identifier : 10.1109/TED.2011.2119487
A Physics-Based Analytical Compact Model for the Drift Region of the HV-MOSFET
Bazigos, A. Krummenacher, F. Sallese, J.-M. Bucher, M. Seebacher, E. Posch, W. Moln??r, K. Tang, M.Page(s): 1710 - 1721
Digital Object Identifier : 10.1109/TED.2011.2119487
This paper presents a novel physics-based analytical compact model for the drift region of a high-voltage metal–oxide–semiconductor field-effect transistor (HV-MOSFET). According to this model, the drift region is considered as a simple 1-D problem, just as that of a low-voltage inner MOS transistor. It exploits the charge-sheet approximation and performs linearization between the charge in the drift region and the surface potential. The drift region model combined with the standar... Read More »
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