May 25, 2011

Papers in IEEE EDL, vol 32, issue 6 (may 2011)

Modeling of Current-Return-Path Effect on Single-Ended Inductor in Millimeter-Wave Regime

Wang, H.  Zhang, L.  Yang, D.  Zeng, D.  Wang, Y.  Yu, Z. 
Page(s): 737 - 739
Digital Object Identifier : 10.1109/LED.2011.2136312

The effect of current return path (CRP) on the accurate modeling of single-ended inductors in the millimeter-wave regime has been investigated. A series of spiral inductors with different sizes, shapes, and CRP positions was fabricated in a 0.18-$muhbox{m}$ RF-CMOS process and measured up to 50 GHz. An analytical appended model for CRP is developed to characterize the effect, and its equivalent circuit is validated by measurement ... Read More »


Simple Analytical Bulk Current Model for Long-Channel Double-Gate Junctionless Transistors

Duarte, J. P.  Choi, S.-J.  Moon, D.-I.  Choi, Y.-K. 
Page(s): 704 - 706
Digital Object Identifier : 10.1109/LED.2011.2127441

A bulk current model is formulated for long-channel double-gate junctionless (DGJL) transistors. Using a depletion approximation, an analytical expression is derived from the Poisson equation to find channel potential, which expresses the dependence of depletion width under an applied gate voltage. The depletion width equation is further simplified by the unique characteristic of junctionless transistors, i.e., a high channel doping concentration. From the depletion width formula, the bulk curre... Read More »



Modeling and Separate Extraction of Gate-Bias- and Channel-Length-Dependent Intrinsic and Extrinsic Source–Drain Resistances in MOSFETs

Bae, H.  Jang, J.  Shin, J. S.  Yun, D.  Lee, J.  Kim, T. W.  Kim, D. H.  Kim, D. M. 
Page(s): 722 - 724
Digital Object Identifier : 10.1109/LED.2011.2131116

A new technique for a separate extraction of the current-path-dependent resistance $(R_{{rm SD}0})$ from the contact-dependent source and drain resistances $(R_{rm Se} hbox{and} R_{rm De})$ is reported for a single MOSFET. We also report a technique for a separation of $V_{rm GS}$ -dependent source an... Read More »


Extraction of Separated Source and Drain Resistances in Amorphous Indium–Gallium–Zinc Oxide TFTs Through CV Characterization

Bae, H.  Kim, S.  Bae, M.  Shin, J. S.  Kong, D.  Jung, H.  Jang, J.  Lee, J.  Kim, D. H.  Kim, D. M. 
Page(s): 761 - 763
Digital Object Identifier : 10.1109/LED.2011.2127438

Considering asymmetry caused by layout, process, and device degradation, separate extraction of the source and drain resistances, i.e., $R_{S}$ and $R_{D}$, respectively, from the total resistance $R_{rm TOT}$ is very important in the design, modeling, and characterization of amorphous indium–g... Read More »



Mechanism Analysis of Off-Leakage Current in an LDD Poly-Si TFT Using Activation Energy

Nakashima, A.  Kimura, M. 
Page(s): 764 - 766
Digital Object Identifier : 10.1109/LED.2011.2132112

We have analyzed the mechanism of off-leakage current in an lightly doped drain (LDD) poly-Si thin-film transistor by investigating the activation energy $E_{a}$. It is found that $E_{a}$ decreases as the gate and drain voltages increase. We have also discussed the mechanism using a device simulator. It is found that a hole channel is lightly formed in the LDD regio... Read More »





Evidence of a Novel Source of Random Telegraph Signal in CMOS Image Sensors

Goiffon, V.  Magnan, P.  Martin-Gonthier, P.  Virmontois, C.  Gaillardin, M. 
Page(s): 773 - 775
Digital Object Identifier : 10.1109/LED.2011.2125940

This letter reports a new source of dark current random telegraph signal in CMOS image sensors due to meta-stable Shockley–Read–Hall generation mechanism at oxide interfaces. The role of oxide defects is discriminated thanks to the use of ionizing radiations. A dedicated RTS detection technique and several test conditions (radiation dose, temperature, integration time, photodiode bias) reveal the particularities of this novel source of RTS. Read More »


 

Temperature Dependence of the Threshold Voltage Shift Induced by Carrier Injection in Integrated STI-Based LDMOS Transistors

Poli, S.  Reggiani, S.  Denison, M.  Gnani, E.  Gnudi, A.  Baccarani, G.  Pendharkar, S.  Wise, R. 
Page(s): 791 - 793
Digital Object Identifier : 10.1109/LED.2011.2135835

Large threshold voltage shifts $(Delta V_{t})$ are experimentally observed in n-channel lateral DMOS transistors under high current–voltage regime. The effect is enhanced by the gate voltage as well as by the ambient temperature $(T_{A})$ . By approximating the curves with the usually adopted power-law dependence ... Read More »





RF Model and Verification of Through-Silicon Vias in Fully Integrated SiGe Power Amplifier

Liao, H.-Y.  Chiou, H.-K. 
Page(s): 809 - 811
Digital Object Identifier : 10.1109/LED.2011.2136313

This letter proposes an RF model of through-silicon via (TSV) considering both skin-depth and lossy substrate effects up to 20 GHz. The TSV is fabricated in 0.18-$muhbox{m}$ SiGe BiCMOS process with the dimensions of 50 $muhbox{m}$ in diameter and 100 $muhbox{m}$ in depth. The equivalent circuit model... Read More »



Channel-Length-Dependent Transport Behaviors of Graphene Field-Effect Transistors

Han, S.-J.  Chen, Z.  Bol, A. A.  Sun, Y. 
Page(s): 812 - 814
Digital Object Identifier : 10.1109/LED.2011.2131113

This letter presents a detailed study of transport in graphene field-effect transistors (GFETs) with various channel lengths, from 5 $muhbox{m}$ down to 90 nm, using transferred graphene grown by chemical vapor deposition. An electron–hole asymmetry observed in short-channel devices suggests a strong impact from graphene/metal contacts. In addition, for the first time, we observe a shift of the gate voltage at the Dirac poi... Read More »



May 20, 2011

Marie Curie PhD position in Catania, Italy

Dear Colleague,

it is a pleasure to inform you that a Marie Curie Early Stage Researcher
position is available at the Institute for Microelectronics and
Microsystem of the National Research Council of Italy (IMM-CNR) in
Catania.
The position is on the topic "Physical issues at interfaces and
nanoscale in advanced SiC devices", and it is open in the framework of
the FP7 Marie Curie ITN - NetFISiC (Training NETwork on Functional
Interfaces for SiC).

You can find more information on the position in the following link:

http://ec.europa.eu/euraxess/index.cfm/jobs/jobDetails/33681023

Would you please inform all the potential applicants for this position
(graduated students in Physics, Engineering or Material Science ) about
this good opportunity.

Should you need more information, contact:

Fabrizio Roccaforte
CNR-IMM
Strada VIII n.5, Zona Industriale
I-95121 Catania
Italy
tel. +39-0955968226
fax. +39-0955968312
e-mail: fabrizio.roccaforte@imm.cnr.it

May 17, 2011

International Journal of Numerical Modelling: Electronic Networks, Devices and Fields, MAY 2011

A physically based, accurate compact model of direct tunneling gate current considering quantum mechanical effects in nanoscale metal-oxide-semiconductor field-effect transistors

  1. M. A. Karim1,2,*,
  2. Q. D. M. Khosru1
Article first published online: 12 MAY 2011
DOI: 10.1002/jnm.817
Cover image for Vol. 24 Issue 3

International Journal of Numerical Modelling: Electronic Networks, Devices and Fields

Early View (Online Version of Record published before inclusion in an issue)

May 12, 2011

Open Ph D scholarship in semiconductor device modeling

We offer one scholarship for a Ph D student position in the Department of Electronic Engineering in the Universitat Rovira i Virgili (URV), in Tarragona, Spain.


The duration of the grant will be for four years. The monthly salary will be about 1000 Euro/month. The position will start in September 2011.

The candidate should have a Bachelor or Master degree in Electrical Engineering, Electronic Engineering, Telecommunication Engineering or Physics. A good background in Semiconductor Physics, Semiconductor Devices, or Integrated Circuit Design will be highly appreciated.

The work to be done by the candidate will be focused on the development of new techniques of characterization and modeling of novel advanced semiconductor devices, in particular nanoscale MOSFETs. It will be related to several European projects in which the hosting group participates, in particular the COmpact MOdelling Netwok (COMON), that is led by the hosting group (the so-called NEPHOS group) and the SQWIRE (Silicon Quantum WIREs) project, about junctionless nanowires.

The NEPHOS group at URV is one of the most powerful teams in Europe in the area of compact modeling of semiconductor devices.


Required documents for applicants


Applicants are required to send to the address specified below the following documents (in English or Spanish):

1) a full Curriculum Vitae (as complete as possible) with passport number

2) Copy of their diploma

3) copy of their passport

4) Academic certificate including their marks (it is important that the number of hours or credits of each subject appears). It is also very important that the document specifies what is the minimum mark for passing a given subject and what is the maximum mark that can be awarded.

Candidates are requested to send their documents by e-mail to:

Prof. Benjamin Iñiguez
Department of Electronic, Electrical and Automatic Control Engineering

Universitat Rovira i Virgili (URV)

Avinguda Països Catalans, 26
43007
Tarragona (Spain)
Email: benjamin.iniguez@gmail.com
Tel: +34977558521 Fax:+34977559610


Deadline: May 31 2011

You can contact Prof. Benjamin Iñiguez (Benjamin.Iniguez@gmail.com) for more information

Tarragona is a medium city (100000 inhabitants) with a Mediterranean climate and many recreation opportunities (nice beaches, theme parks, nature preserves, mountain hiking, touristic resorts and facilities). It is located 100 km Southwest of Barcelona, and it is very well connected by train, bus, highways and even low cost flights from its own airport. Additional information about the University and the department can be found at: www.urv.cat and sauron.etse.urv.es