[2nd Day Photos] 13th International MOS-AK Workshop

13th International MOS-AK Workshop was organized jointly with THM Giessen who has provided ZOOM meeting platform for the online event. 50+ registered participants have attended 2nd day with two further MOS-AK sessions and followed 7 technical talks

MOS-AK session III - 11:00 - 14:00 (PST) on Dec.11, 2020
Chair: Anurag Mangla; Semtech Neuchatel (CH)

[8] Statistical Analysis of MOSFET extracted parameters for n-MOS mismatch modeling.

Juan Pablo Martinez Brito

CEITEC SA/UFRGS (BR)

[9] Rapid multiscale simulation of nanoscale MOSFETs: Is an interplay between compact models and NEGF possible?

Alexander Kloes

NanoP, THM University of Applied Sciences (D)

[10] The Effect of Non Rectangular MOS Channels in Modelling High Voltage Lateral MOS

Marco Sambi, Lorenzo Labate, Simona Cozzi, Nicola Holzer

STMicroelectronics (I)

MOS-AK session IV
Chair: Daniel Tomaszewski, Lukasiewicz - IMiF, Warsaw (PL)

[11] Nonlinear Embedding Model for the Accelerated Design of PAs with the ASM-HEMT model

Patrick Roblin*, Miles Lindquist*, Nicholas Miller+ and Marek Mierzwinski^

*The Ohio State University, AFRL+, Keysight Corp.^ (USA)

[12] New analytical model for AOSTFTs

Antonio Cerdeira, Yoanlys Hernandez-Barrios, Magali Estrada, Benjamin Iniguez

CINVESTAV (MX) and URV (SP)

[13] Unifying the Modeling of Charge Trapping in RTN, 1/f Noise and BTI

Gilson Wirth

UFRGS (BR)

[14] SPICE Modeling for Display Technologies

Bogdan Tudor

Silvaco (USA)

MOS-AK attendees group photo of 2nd MOS-AK workshop day:

MOS-AK attendees group photo (1)

MOS-AK attendees group photo (2)